Multi-layer MoS2 FET with small hysteresis by using atomic layer deposition Al2O3 as gate insulator

Ah Jin Cho, Suk Yang, Kyung Park, Seok Daniel Namgung, Hojoong Kim, Jang Yeon Kwon

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

Two-dimensionalmaterials like graphene have great potential to excess the mobility limit of conventional silicon devices. Particularly, MoS2 FETs have high mobility and low off-current simultaneously due to their sizable band-gap. However, large hysteresis in its transfer curve is an obstacle for implementation to logic circuits and switching devices. Here, we report on a multi-layer MoS2 FET using atomic layer deposition Al 2O3 as a gate insulator, showing small hysteresis of 0.86 V. It is thought that, such improvement in the hysteresis attributes to the small trap at the MoS2/Al2O3 interface, and it is confirmed through a constant current stress test.

Original languageEnglish
Pages (from-to)Q67-Q69
JournalECS Solid State Letters
Volume3
Issue number10
DOIs
Publication statusPublished - 2014

Fingerprint

Atomic layer deposition
Field effect transistors
Hysteresis
Graphite
Logic circuits
Silicon
Graphene
Energy gap

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Cho, Ah Jin ; Yang, Suk ; Park, Kyung ; Namgung, Seok Daniel ; Kim, Hojoong ; Kwon, Jang Yeon. / Multi-layer MoS2 FET with small hysteresis by using atomic layer deposition Al2O3 as gate insulator. In: ECS Solid State Letters. 2014 ; Vol. 3, No. 10. pp. Q67-Q69.
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Multi-layer MoS2 FET with small hysteresis by using atomic layer deposition Al2O3 as gate insulator. / Cho, Ah Jin; Yang, Suk; Park, Kyung; Namgung, Seok Daniel; Kim, Hojoong; Kwon, Jang Yeon.

In: ECS Solid State Letters, Vol. 3, No. 10, 2014, p. Q67-Q69.

Research output: Contribution to journalArticle

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