Multi-stacked layer in the solution processing of hfo2 films to obtain superior electrical performance in liquid crystal devices

Seon Yeong Kim, Hong Gyu Park, Min Jae Cho, Dae Geun Yang, Dai Hyun Kim, Dae Shik Seo

Research output: Contribution to journalArticle

Abstract

The use of an alignment layer between liquid crystals (LCs) and solution-processed inorganic materials has been studied primarily for its application to next generation display technologies. However, solution-processing results in porous films and defects. In this study, we used hafnium (IV) oxide (HfO2) alignment films in a multi-stacked layer (MSL) for a high performance device. Laminating the layer more, the density of the films and smoothed their roughness. These effects resulted from the low trapping rate of electrons and holes in the MSL. Therefore, the LCs were well-aligned in the MSL-based devices.

Original languageEnglish
Pages (from-to)R15-R17
JournalECS Solid State Letters
Volume3
Issue number4
DOIs
Publication statusPublished - 2014

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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