Multifunctional bowtie-shaped ridge aperture fo overlay alignment in plasmonic direct writing lithography using a contact probe

Seonghyeon Oh, Taekyong Lee, Jae W. Hahn

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We propose a scheme of overlay alignment for plasmonic lithography using a scanning contact probe. Using two resonances of a ridge aperture in a metal film, we introduce the aperture's multifunctional characteristics for patterning and alignment at different wavelengths. To verify this idea, we measure an image of analignment mark using a scanning ridge aperture and determine the reference point for the alignment. We then analyze the uncertainty of the alignment method with respect tothe image data noise and compare the numerical results with the experimental results. The uncertainty of the overlay alignment method is shown to be less than approximately 2 nm.

Original languageEnglish
Pages (from-to)2250-2252
Number of pages3
JournalOptics Letters
Volume38
Issue number13
DOIs
Publication statusPublished - 2013 Jul 1

Fingerprint

ridges
lithography
apertures
alignment
probes
scanning
metal films
wavelengths

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

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abstract = "We propose a scheme of overlay alignment for plasmonic lithography using a scanning contact probe. Using two resonances of a ridge aperture in a metal film, we introduce the aperture's multifunctional characteristics for patterning and alignment at different wavelengths. To verify this idea, we measure an image of analignment mark using a scanning ridge aperture and determine the reference point for the alignment. We then analyze the uncertainty of the alignment method with respect tothe image data noise and compare the numerical results with the experimental results. The uncertainty of the overlay alignment method is shown to be less than approximately 2 nm.",
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Multifunctional bowtie-shaped ridge aperture fo overlay alignment in plasmonic direct writing lithography using a contact probe. / Oh, Seonghyeon; Lee, Taekyong; Hahn, Jae W.

In: Optics Letters, Vol. 38, No. 13, 01.07.2013, p. 2250-2252.

Research output: Contribution to journalArticle

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AB - We propose a scheme of overlay alignment for plasmonic lithography using a scanning contact probe. Using two resonances of a ridge aperture in a metal film, we introduce the aperture's multifunctional characteristics for patterning and alignment at different wavelengths. To verify this idea, we measure an image of analignment mark using a scanning ridge aperture and determine the reference point for the alignment. We then analyze the uncertainty of the alignment method with respect tothe image data noise and compare the numerical results with the experimental results. The uncertainty of the overlay alignment method is shown to be less than approximately 2 nm.

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