Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles

Jahyun Yang, Kyungtaek Im, Juneyoung Lee, Sangwoo Lim

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO3) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H2.

Original languageEnglish
Pages (from-to)763-766
Number of pages4
JournalJournal of Industrial and Engineering Chemistry
Volume15
Issue number5
DOIs
Publication statusPublished - 2009 Sep 25

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Latexes
Particles (particulate matter)
Fourier transform infrared spectroscopy
Polystyrenes
Deionized water
Photomasks
Peroxides
Cleaning
Semiconductor materials
Scanning electron microscopy
styrofoam

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)

Cite this

@article{3853491cc82b4e81a945c269dc9579cc,
title = "Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles",
abstract = "Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO3) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H2.",
author = "Jahyun Yang and Kyungtaek Im and Juneyoung Lee and Sangwoo Lim",
year = "2009",
month = "9",
day = "25",
doi = "10.1016/j.jiec.2009.09.060",
language = "English",
volume = "15",
pages = "763--766",
journal = "Journal of Industrial and Engineering Chemistry",
issn = "1226-086X",
publisher = "Korean Society of Industrial Engineering Chemistry",
number = "5",

}

Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles. / Yang, Jahyun; Im, Kyungtaek; Lee, Juneyoung; Lim, Sangwoo.

In: Journal of Industrial and Engineering Chemistry, Vol. 15, No. 5, 25.09.2009, p. 763-766.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Multiple internal reflection Fourier transform-infrared spectroscopy study on Si surface for measurement of PSL particles

AU - Yang, Jahyun

AU - Im, Kyungtaek

AU - Lee, Juneyoung

AU - Lim, Sangwoo

PY - 2009/9/25

Y1 - 2009/9/25

N2 - Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO3) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H2.

AB - Measurement of particles is crucial in wafer and photomask cleaning. In order to develop a simple method to quantify the number of particles on a semiconductor wafer, multiple internal reflection Fourier transform-infrared spectroscopy (MIR FT-IR) was used. The results using this measurement technique revealed that the number of polystyrene latex (PSL) particles deposited on a Si surface linearly increase with the concentration of PSL particles in deionized water. Furthermore, the ozonated deionized water (DIO3) process was superior to the sulfuric peroxide mixture (SPM) process in suppressing the deposition of PSL particles. Using this measurement technique in combination with scanning electron microscopy (SEM) measurements, the number of PSL spheres in a unit area could be estimated from the peak absorbance intensity of C-H2.

UR - http://www.scopus.com/inward/record.url?scp=70449533122&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70449533122&partnerID=8YFLogxK

U2 - 10.1016/j.jiec.2009.09.060

DO - 10.1016/j.jiec.2009.09.060

M3 - Article

AN - SCOPUS:70449533122

VL - 15

SP - 763

EP - 766

JO - Journal of Industrial and Engineering Chemistry

JF - Journal of Industrial and Engineering Chemistry

SN - 1226-086X

IS - 5

ER -