Nano patterning with a single high-transmission nano-metal aperture system

Yongwoo Kim, Sinjeung Park, Eungman Lee, Jae Won Hahn

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We design a C-shaped aperture which overcomes the diffraction limit of light to produce a high-brightness nano-size light spot. For optical nano lithography, we construct a nano patterning system using an optical probe which adopts a solid immersion lens (SIL), the 120 nm thickness aluminum film on the bottom surface of the SIL and the C-shaped aperture engraved in the metal film. Light source is a diode laser of 405nm wavelength to expose h-line photoresist(PR). A linear stage holding the optical probe makes the nano aperture contact with the PR coated on silicon wafer. Using this patterning system, we obtain sub 100nm array patterns and measure the system performance in various exposure conditions to verify the feasibility of plasmonic lithography.

Original languageEnglish
Title of host publicationEmerging Lithographic Technologies XII
Volume6921
DOIs
Publication statusPublished - 2008 Dec 1
EventEmerging Lithographic Technologies XII - San Jose, CA, United States
Duration: 2008 Feb 262008 Feb 28

Other

OtherEmerging Lithographic Technologies XII
CountryUnited States
CitySan Jose, CA
Period08/2/2608/2/28

Fingerprint

Photoresists
Patterning
Lithography
Lenses
Photoresist
Metals
apertures
Immersion
photoresists
submerging
Lens
Probe
lithography
Aluminum
Silicon wafers
lenses
metals
Light sources
Semiconductor lasers
Luminance

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Kim, Y., Park, S., Lee, E., & Hahn, J. W. (2008). Nano patterning with a single high-transmission nano-metal aperture system. In Emerging Lithographic Technologies XII (Vol. 6921). [69212C] https://doi.org/10.1117/12.774485
Kim, Yongwoo ; Park, Sinjeung ; Lee, Eungman ; Hahn, Jae Won. / Nano patterning with a single high-transmission nano-metal aperture system. Emerging Lithographic Technologies XII. Vol. 6921 2008.
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Kim, Y, Park, S, Lee, E & Hahn, JW 2008, Nano patterning with a single high-transmission nano-metal aperture system. in Emerging Lithographic Technologies XII. vol. 6921, 69212C, Emerging Lithographic Technologies XII, San Jose, CA, United States, 08/2/26. https://doi.org/10.1117/12.774485

Nano patterning with a single high-transmission nano-metal aperture system. / Kim, Yongwoo; Park, Sinjeung; Lee, Eungman; Hahn, Jae Won.

Emerging Lithographic Technologies XII. Vol. 6921 2008. 69212C.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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AB - We design a C-shaped aperture which overcomes the diffraction limit of light to produce a high-brightness nano-size light spot. For optical nano lithography, we construct a nano patterning system using an optical probe which adopts a solid immersion lens (SIL), the 120 nm thickness aluminum film on the bottom surface of the SIL and the C-shaped aperture engraved in the metal film. Light source is a diode laser of 405nm wavelength to expose h-line photoresist(PR). A linear stage holding the optical probe makes the nano aperture contact with the PR coated on silicon wafer. Using this patterning system, we obtain sub 100nm array patterns and measure the system performance in various exposure conditions to verify the feasibility of plasmonic lithography.

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Kim Y, Park S, Lee E, Hahn JW. Nano patterning with a single high-transmission nano-metal aperture system. In Emerging Lithographic Technologies XII. Vol. 6921. 2008. 69212C https://doi.org/10.1117/12.774485