Nano patterning with a single high-transmission nano-metal aperture system

Yongwoo Kim, Sinjeung Park, Eungman Lee, Jae W. Hahn

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)


We design a C-shaped aperture which overcomes the diffraction limit of light to produce a high-brightness nano-size light spot. For optical nano lithography, we construct a nano patterning system using an optical probe which adopts a solid immersion lens (SIL), the 120 nm thickness aluminum film on the bottom surface of the SIL and the C-shaped aperture engraved in the metal film. Light source is a diode laser of 405nm wavelength to expose h-line photoresist(PR). A linear stage holding the optical probe makes the nano aperture contact with the PR coated on silicon wafer. Using this patterning system, we obtain sub 100nm array patterns and measure the system performance in various exposure conditions to verify the feasibility of plasmonic lithography.

Original languageEnglish
Title of host publicationEmerging Lithographic Technologies XII
Publication statusPublished - 2008
EventEmerging Lithographic Technologies XII - San Jose, CA, United States
Duration: 2008 Feb 262008 Feb 28

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherEmerging Lithographic Technologies XII
Country/TerritoryUnited States
CitySan Jose, CA

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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