A relatively simple, reliable, and high-speed nano-patteming technique called mechano-chemical scanning probe lithography (MC-SPL) has been developed. The principle of MC-SPL is based on the nano-scale abrasive interaction between a nano-probe and a workpiece surface. The nanolithography technique consists of two sequential processes, namely, a mechanical scribing process of an ultra-thin self-assembled monolayers (SAMs) resist film coated on the workpiece substrate by using a nano-probe and a subsequent chemical etching process of the substrate material at regions where the resist has been removed during the mechanical scribing process. In order to fabricate sub-100 nm groove patterns at high speeds, it is important to identify the optimum machining conditions based on the fundamental understanding of nano-wear characteristics of the SAM resist layer. Experimental results showed that MC-SPL has the capability of patterning under relatively high speeds of up to 1 mm/s without degradation of pattern integrity. Such high speeds could be realized since the patterning can be achieved by only a direct-writing process without time-consuming physicochemical reactions that are inevitable in other probe-based lithography methods. By using this technique, patterns with width of sub-100 nm could be fabricated over an area of about 10,000 μm 2 of silicon and various metal surfaces with flat and non-flat geometry at the patterning speed of 1 mm/s.
Bibliographical noteFunding Information:
This research was supported by a grant (code no. M102KN010006-04K1401-00623) from Center for Nanoscale Mechatronics and Manufacturing, one of the 21st Century Frontier Research Programs, which are supported by Ministry of Science and Technology, Korea.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films