Nanomaterials fabrication using advanced thin film deposition and nanohybrid process

Hyungjun Kim, Han Bo Ram Lee, Woo Hee Kim, Sang Joon Park, In Chan Hwang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

With device scaling, the introduction of emerging materials including nanowires and nanodots is required more than ever. We present several examples of making nanomaterials based on advanced thin film deposition techniques including atomic layer deposition, supercritical fluid deposition (SCFD), and selective epitaxial growth (SEG), and nanohybrid process utilizing self-assembled nanotemplate. Metallic nanomaterials were synthesized by highly conformal ALD Ru and anodic aluminum oxide (AAO) nanotemplate as well as by spontaneous formation during plasma enhanced ALD Co. Also, using SCFD with high gap fill properties, Ru nanoparticles and RuO2 nanorod were fabricated. Finally, using self-assembled diblock copolymer as a template, ordered array of SiGe nanodots were fabricated by employing SEG.

Original languageEnglish
Title of host publication2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
Pages3-4
Number of pages2
DOIs
Publication statusPublished - 2009
Event2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009 - Traverse City, MI, United States
Duration: 2009 Jun 22009 Jun 5

Publication series

Name2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009

Other

Other2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
CountryUnited States
CityTraverse City, MI
Period09/6/209/6/5

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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