Nanometer-level repeatable metrology using the Nanoruler

Paul T. Konkola, Carl G. Chen, Ralf K. Heilmann, Chulmin Joo, Juan C. Montoya, Chih Hao Chang, Mark L. Schattenburg

Research output: Contribution to journalArticle

46 Citations (Scopus)

Abstract

The measurement of the fringe-to-substrate phase error in Nanoruler system was discussed. The system used an scanning beam interference lithography (SBIL) to pattern large gratings and grids with nanometer-level accuracy. The metrology interferometer system was based on digital frequency synthesizers, acoustooptics and heterodyne phase sensing. The short and long term errors of the system, and errors during scaning and wafer mapping routines were also analyzed.

Original languageEnglish
Pages (from-to)3097-3101
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number6
Publication statusPublished - 2003 Nov 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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  • Cite this

    Konkola, P. T., Chen, C. G., Heilmann, R. K., Joo, C., Montoya, J. C., Chang, C. H., & Schattenburg, M. L. (2003). Nanometer-level repeatable metrology using the Nanoruler. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 21(6), 3097-3101.