The measurement of the fringe-to-substrate phase error in Nanoruler system was discussed. The system used an scanning beam interference lithography (SBIL) to pattern large gratings and grids with nanometer-level accuracy. The metrology interferometer system was based on digital frequency synthesizers, acoustooptics and heterodyne phase sensing. The short and long term errors of the system, and errors during scaning and wafer mapping routines were also analyzed.
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Publication status||Published - 2003 Nov 1|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering