Antireflective Si subwavelength structures (SWSs) are fabricated after the texturing of nano-scale holes directly onto micro-scale inverted pyramid arrays. Thermally agglomerated Au catalysts and Au-assisted chemical etching adjusted the featured nanohole sizes that determined surface reflection. When nano-scale SWSs were textured into micro-scale inverted pyramids, the total reflectance was dramatically decreased to 2.9% in a wavelength region of 200-1100 nm. Additionally, the average specular reflectance value was below 3.6% up to the incident angle of 60°. The surface reflection was efficiently suppressed by combining the light trap of microstructures and anti-reflectance of nanostructures. This technique demonstrated the feasibility of nano/micro double textured structures for application in high-performance optical devices.
Bibliographical noteFunding Information:
This research was supported by the MSIP (Ministry of Science, ICT and Future Planning), Korea, under the “IT Consilience Creative Program” (IITP-2015-R0346-15-1008) supervised by the IITP (Institute for Information & Communications Technology Promotion). This research was also supported by grants from the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2013R1A1A2012111 ) and Future Semiconductor Device Technology Development Program ( 10044735 ) funded by MOTIE and KSRC.
© 2016 Elsevier Ltd.
All Science Journal Classification (ASJC) codes
- Renewable Energy, Sustainability and the Environment
- Materials Science(all)