Nanostructured TiO2 diffraction grating fabricated via imprinting and TiCl4 treatment

Jeeyoung Lee, Jisuk Park, Myeongkyu Lee

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

We show here that a highly effective diffraction grating can be embedded into a nanoparticulate TiO2 film via imprinting combined with TiCl4 treatment. A thin TiO2 film spin-coated on a glass substrate was patterned by imprinting and this patterned layer was TiCl 4-treated with a higher concentration than for a thicker over-coated TiO2 film. Due to the refractive index difference between the two layers, the incident light could be strongly diffracted. Different types of gratings have been incorporated into the films. A line grating with a 2 μm period and 1.2 μm thickness generated diffracted beams up to 3rd-order, with total diffraction efficiencies over 90% at 633 nm. This method has potential applications in TiO2-based photovoltaic and photocatalytic devices.

Original languageEnglish
Pages (from-to)981-985
Number of pages5
JournalJournal of Materials Chemistry C
Volume2
Issue number6
DOIs
Publication statusPublished - 2014 Feb 14

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Diffraction gratings
Diffraction efficiency
Refractive index
Glass
Thin films
Substrates
titanium tetrachloride

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Chemistry

Cite this

@article{4fdf603e0b6248668506e1ce51d25126,
title = "Nanostructured TiO2 diffraction grating fabricated via imprinting and TiCl4 treatment",
abstract = "We show here that a highly effective diffraction grating can be embedded into a nanoparticulate TiO2 film via imprinting combined with TiCl4 treatment. A thin TiO2 film spin-coated on a glass substrate was patterned by imprinting and this patterned layer was TiCl 4-treated with a higher concentration than for a thicker over-coated TiO2 film. Due to the refractive index difference between the two layers, the incident light could be strongly diffracted. Different types of gratings have been incorporated into the films. A line grating with a 2 μm period and 1.2 μm thickness generated diffracted beams up to 3rd-order, with total diffraction efficiencies over 90{\%} at 633 nm. This method has potential applications in TiO2-based photovoltaic and photocatalytic devices.",
author = "Jeeyoung Lee and Jisuk Park and Myeongkyu Lee",
year = "2014",
month = "2",
day = "14",
doi = "10.1039/c3tc32018a",
language = "English",
volume = "2",
pages = "981--985",
journal = "Journal of Materials Chemistry C",
issn = "2050-7526",
publisher = "Royal Society of Chemistry",
number = "6",

}

Nanostructured TiO2 diffraction grating fabricated via imprinting and TiCl4 treatment. / Lee, Jeeyoung; Park, Jisuk; Lee, Myeongkyu.

In: Journal of Materials Chemistry C, Vol. 2, No. 6, 14.02.2014, p. 981-985.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Nanostructured TiO2 diffraction grating fabricated via imprinting and TiCl4 treatment

AU - Lee, Jeeyoung

AU - Park, Jisuk

AU - Lee, Myeongkyu

PY - 2014/2/14

Y1 - 2014/2/14

N2 - We show here that a highly effective diffraction grating can be embedded into a nanoparticulate TiO2 film via imprinting combined with TiCl4 treatment. A thin TiO2 film spin-coated on a glass substrate was patterned by imprinting and this patterned layer was TiCl 4-treated with a higher concentration than for a thicker over-coated TiO2 film. Due to the refractive index difference between the two layers, the incident light could be strongly diffracted. Different types of gratings have been incorporated into the films. A line grating with a 2 μm period and 1.2 μm thickness generated diffracted beams up to 3rd-order, with total diffraction efficiencies over 90% at 633 nm. This method has potential applications in TiO2-based photovoltaic and photocatalytic devices.

AB - We show here that a highly effective diffraction grating can be embedded into a nanoparticulate TiO2 film via imprinting combined with TiCl4 treatment. A thin TiO2 film spin-coated on a glass substrate was patterned by imprinting and this patterned layer was TiCl 4-treated with a higher concentration than for a thicker over-coated TiO2 film. Due to the refractive index difference between the two layers, the incident light could be strongly diffracted. Different types of gratings have been incorporated into the films. A line grating with a 2 μm period and 1.2 μm thickness generated diffracted beams up to 3rd-order, with total diffraction efficiencies over 90% at 633 nm. This method has potential applications in TiO2-based photovoltaic and photocatalytic devices.

UR - http://www.scopus.com/inward/record.url?scp=84892738710&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84892738710&partnerID=8YFLogxK

U2 - 10.1039/c3tc32018a

DO - 10.1039/c3tc32018a

M3 - Article

AN - SCOPUS:84892738710

VL - 2

SP - 981

EP - 985

JO - Journal of Materials Chemistry C

JF - Journal of Materials Chemistry C

SN - 2050-7526

IS - 6

ER -