New effect of Ti-capping layer in co salicide process promising for deep sub-quarter micron technology

Ja Hum Ku, Chul Sung Kim, Chul Joon Choi, Kazuyuki Fujihara, Ho Kyu Kang, Moon Yong Lee, Ju Hyuck Chung, Eung Joon Lee, Jang Eun Lee, Dae Hong Ko

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds