Nitridation for HfO2 high-k films on Si by an NH3 annealing treatment

M. H. Cho, K. B. Chung, C. N. Whang, D. H. Ko, J. H. Lee, N. I. Lee

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)


Dive into the research topics of 'Nitridation for HfO<sub>2</sub> high-k films on Si by an NH<sub>3</sub> annealing treatment'. Together they form a unique fingerprint.

Physics & Astronomy