Nitrocellulose-based collodion gate insulator for amorphous indium zinc gallium oxide thin-film transistors

Won Gi Kim, Young Jun Tak, Hyun Jae Kim

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)


A novel organic material named ‘collodion’ was suggested as a gate insulator for amorphous indium gallium zinc oxide thin-film transistors (a-IGZO TFTs). To find the optimized condition of the collodion gate insulator (CGI), the following three parameters of collodion solution were controlled: (1) the concentration of collodion solution; (2) the number of stacked layers; and (3) the spin-coating speed. The single-layered diluted CGI (collodion:ethanol=1:1) that was fabricated with a 3 krpm spin-coating speed exhibited an acceptable dielectric strength (J < 10−10A/cm2 in the range of 1.1 MV/cm) and a high-dielectric constant (∼6.57) for the gate insulator layer. As a result, a-IGZO TFTs with CGI showed high-field effect mobility (∼17.11 cm2/Vs).

Original languageEnglish
Pages (from-to)39-43
Number of pages5
JournalJournal of Information Display
Issue number1
Publication statusPublished - 2018 Jan 2

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (No. 2017R1A2B3008719) and Samsung Display.

Publisher Copyright:
© 2017 The Author(s). Published by Taylor & Francis Group on behalf of the Korean Information Display Society.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Electrical and Electronic Engineering


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