Nitrogen actinometry for measurement of nitrogen radical spatial distribution in large-area plasma-enhanced chemical vapor deposition

Changhoon Oh, Minwook Kang, Seungsuk Nam, Jae W. Hahn

Research output: Contribution to journalArticle

2 Citations (Scopus)


Density distributions of radicals in the large-area silicon nitride (Si3N4) plasma-enhanced chemical vapor deposition (PECVD) process were measured using a spatially resolvable optical emission spectrometer (SROES). To determine the qualitative distribution of a target radical, the authors used optical actinometry with nitrogen (N2) gas as an actinometer. To compare the SROES data and process results, the thickness of the deposited Si3N4 thin films using an ellipsometer was measured. By introducing nitrogen-based optical actinometry, the authors obtained very good agreement between the experimental results of the distributions of atomic nitrogen radical and the deposited thicknesses of Si3N4 thin films. Based on these experimental results, the uniformity of the process plasma in the PECVD process at different applied radio frequency powers was analyzed.

Original languageEnglish
Article number031303
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number3
Publication statusPublished - 2013 May 1


All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this