Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

T. A. Roberts, Dae Hong Ko, K. E. Gray, Y. Y. Wang, R. P.H. Chang, S. Ogawa

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi 2 . These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

Original languageEnglish
Number of pages1
JournalApplied Physics Letters
Publication statusPublished - 1995 Dec 1

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x ray fluorescence
profiles
annealing
angular distribution
inversions
transmission electron microscopy
probes
cross sections
thin films
x rays

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

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abstract = "The depth profile of a Co (300 {\AA})/Ti (50 {\AA}) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi 2 . These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.",
author = "Roberts, {T. A.} and Ko, {Dae Hong} and Gray, {K. E.} and Wang, {Y. Y.} and Chang, {R. P.H.} and S. Ogawa",
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journal = "Applied Physics Letters",
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Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence. / Roberts, T. A.; Ko, Dae Hong; Gray, K. E.; Wang, Y. Y.; Chang, R. P.H.; Ogawa, S.

In: Applied Physics Letters, 01.12.1995.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

AU - Roberts, T. A.

AU - Ko, Dae Hong

AU - Gray, K. E.

AU - Wang, Y. Y.

AU - Chang, R. P.H.

AU - Ogawa, S.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi 2 . These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

AB - The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi 2 . These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

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