Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

T. A. Roberts; D. H. Ko; K. E. Gray; Y. Y. Wang; R. P.H. Chang; S. Ogawa

doi:10.1063/1.113900

Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

T. A. Roberts, D. H. Ko, K. E. Gray, Y. Y. Wang, R. P.H. Chang, S. Ogawa

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi₂. These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

Original language	English
Pages (from-to)	2054
Number of pages	1
Journal	Applied Physics Letters
DOIs	https://doi.org/10.1063/1.113900
Publication status	Published - 1995

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.113900

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title = "Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence",

abstract = "The depth profile of a Co (300 {\AA})/Ti (50 {\AA}) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi2. These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.",

author = "Roberts, {T. A.} and Ko, {D. H.} and Gray, {K. E.} and Wang, {Y. Y.} and Chang, {R. P.H.} and S. Ogawa",

year = "1995",

doi = "10.1063/1.113900",

language = "English",

pages = "2054",

journal = "Applied Physics Letters",

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T1 - Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

AU - Roberts, T. A.

AU - Ko, D. H.

AU - Gray, K. E.

AU - Wang, Y. Y.

AU - Chang, R. P.H.

AU - Ogawa, S.

PY - 1995

Y1 - 1995

N2 - The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi2. These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

AB - The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi2. These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

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DO - 10.1063/1.113900

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AN - SCOPUS:36449003780

SN - 0003-6951

SP - 2054

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -

Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

Abstract

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