The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi2. These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.
|Number of pages||1|
|Journal||Applied Physics Letters|
|Publication status||Published - 1995|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)