Novel orthogonal velocity polishing tool and its material removal characteristics from CVD SiC mirror surfaces

Hyunju Seo, Jeong Yeol Han, Sug Whan Kim, Sehyun Seong, Siyoung Yoon, Kyoungmuk Lee, Jinsuk Hong, Haengbok Lee, Mingab Bok

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

A new and patented polishing tool called Orthogonal Velocity field Tool (OVT) was built and its material removal characteristics from Chemical Vapor Deposition Silicon Carbide (CVD SiC) mirror surfaces were investigated in this study. The velocity field of OVT is produced by rotating the bicycle type tool in the two orthogonal axes, and this concept is capable of producing a material removal foot print of pseudo Gaussian shapes. First for the OVT characterization, we derived a theoretical material removal model using distributions of pressure exerted onto the workpiece surface, relative speed between the tool and workpiece surface, and dwell time inside the tool- workpiece contact area. Second, using two flat CVD SiC mirrors that are 150 mm in diameter, we ran material removal experiments over machine run parameter ranging from 12.901 to 25.867 psi in pressure, from 0.086 m/sec to 0.147 m/sec tool in the relative speed, and 5 to 15 sec in dwell time. Material removal coefficients are obtained by using the in-house developed data analysis program. The resulting material removal coefficient varies from 3.35 to 9.46 um/psi hour m/sec with a mean value of 5.90 ± 1.26 (standard deviation). We describe the technical details of the new OVT machine, the data analysis program, the experiments, and the results together with the implications to the future development of the machine.

Original languageEnglish
Pages (from-to)12349-12366
Number of pages18
JournalOptics Express
Volume24
Issue number11
DOIs
Publication statusPublished - 2016 May 30

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

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