Novel shallow trench isolation process using flowable oxide CVD for sub-100 nm DRAM

Sung Woong Chung, Sang Tae Ahn, Hyun Chul Sohn, Jachun Ku, Sungki Park, Yong Wook Song, Hyo Sik Park, Sang Don Lee

Research output: Contribution to journalConference articlepeer-review

11 Citations (Scopus)

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