Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber

Y. Park, T. J. Ahn, Y. H. Kim, W. T. Han, U. C. Paek, Dug Young Kim

Research output: Contribution to conferencePaper

8 Citations (Scopus)

Abstract

A novel method is demonstrated for determining the photoelastic effect profile as well as the residual stress profile of an optical fiber for the first time. Measurement results of the residual stress profiles and the photoelastic effect profiles of a B-Ge doped fiber and an Er-Al doped fiber are demonstrated by using this technique with its spatial resolution better than 0.8μm.

Original languageEnglish
Publication statusPublished - 2001 Jan 1
EventOptical Fiber Communication Conference - Anaheim, CA, United States
Duration: 2001 Mar 172001 Mar 22

Other

OtherOptical Fiber Communication Conference
CountryUnited States
CityAnaheim, CA
Period01/3/1701/3/22

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Photoelasticity
Optical fibers
Residual stresses
Fibers

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Park, Y., Ahn, T. J., Kim, Y. H., Han, W. T., Paek, U. C., & Kim, D. Y. (2001). Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber. Paper presented at Optical Fiber Communication Conference, Anaheim, CA, United States.
Park, Y. ; Ahn, T. J. ; Kim, Y. H. ; Han, W. T. ; Paek, U. C. ; Kim, Dug Young. / Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber. Paper presented at Optical Fiber Communication Conference, Anaheim, CA, United States.
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abstract = "A novel method is demonstrated for determining the photoelastic effect profile as well as the residual stress profile of an optical fiber for the first time. Measurement results of the residual stress profiles and the photoelastic effect profiles of a B-Ge doped fiber and an Er-Al doped fiber are demonstrated by using this technique with its spatial resolution better than 0.8μm.",
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Park, Y, Ahn, TJ, Kim, YH, Han, WT, Paek, UC & Kim, DY 2001, 'Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber' Paper presented at Optical Fiber Communication Conference, Anaheim, CA, United States, 01/3/17 - 01/3/22, .

Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber. / Park, Y.; Ahn, T. J.; Kim, Y. H.; Han, W. T.; Paek, U. C.; Kim, Dug Young.

2001. Paper presented at Optical Fiber Communication Conference, Anaheim, CA, United States.

Research output: Contribution to conferencePaper

TY - CONF

T1 - Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber

AU - Park, Y.

AU - Ahn, T. J.

AU - Kim, Y. H.

AU - Han, W. T.

AU - Paek, U. C.

AU - Kim, Dug Young

PY - 2001/1/1

Y1 - 2001/1/1

N2 - A novel method is demonstrated for determining the photoelastic effect profile as well as the residual stress profile of an optical fiber for the first time. Measurement results of the residual stress profiles and the photoelastic effect profiles of a B-Ge doped fiber and an Er-Al doped fiber are demonstrated by using this technique with its spatial resolution better than 0.8μm.

AB - A novel method is demonstrated for determining the photoelastic effect profile as well as the residual stress profile of an optical fiber for the first time. Measurement results of the residual stress profiles and the photoelastic effect profiles of a B-Ge doped fiber and an Er-Al doped fiber are demonstrated by using this technique with its spatial resolution better than 0.8μm.

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M3 - Paper

ER -

Park Y, Ahn TJ, Kim YH, Han WT, Paek UC, Kim DY. Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber. 2001. Paper presented at Optical Fiber Communication Conference, Anaheim, CA, United States.