Novel technique for measuring the residual stress and the photoelastic effect profile of an optical fiber

Y. Park, T. J. Ahn, Y. H. Kim, W. T. Han, U. C. Paek, D. Y. Kim

Research output: Contribution to conferencePaperpeer-review

8 Citations (Scopus)

Abstract

A novel method is demonstrated for determining the photoelastic effect profile as well as the residual stress profile of an optical fiber for the first time. Measurement results of the residual stress profiles and the photoelastic effect profiles of a B-Ge doped fiber and an Er-Al doped fiber are demonstrated by using this technique with its spatial resolution better than 0.8μm.

Original languageEnglish
PagesTuM4/1-TuM4/3
Publication statusPublished - 2001
EventOptical Fiber Communication Conference - Anaheim, CA, United States
Duration: 2001 Mar 172001 Mar 22

Other

OtherOptical Fiber Communication Conference
CountryUnited States
CityAnaheim, CA
Period01/3/1701/3/22

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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