Abstract
We report the growth mechanism and optical characteristics of type-II band-aligned GaSb quantum dots (QDs) grown on GaAs using a droplet epitaxy-driven nanowire formation mechanism with molecular beam epitaxy. Using transmission electron microscopy and scanning electron microscopy images, we confirmed that the QDs, which comprised zinc-blende crystal structures with hexagonal shapes, were successfully grown through the formation of a nanowire from a Ga droplet, with reduced strain between GaAs and GaSb. Photoluminescence (PL) peaks of GaSb capped by a GaAs layer were observed at 1.11 eV, 1.26 eV, and 1.47 eV, assigned to the QDs, a wetting-like layer (WLL), and bulk GaAs, respectively, at the measurement temperature of 14 K and excitation laser power of 30 mW. The integrated PL intensity of the QDs was significantly stronger than that of the WLL, which indicated well-grown GaSb QDs on GaAs and the generation of an interlayer exciton, as shown in the power- and temperature-dependent PL spectra, respectively. In addition, time-resolved PL data showed that the GaSb QD and GaAs layers formed a self-aligned type-II band alignment; the temperature-dependent PL data exhibited a high equivalent internal quantum efficiency of 15 ± 0.2%.
Original language | English |
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Article number | 7699 |
Journal | Scientific reports |
Volume | 11 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2021 Dec |
Bibliographical note
Funding Information:This research was supported by an IITP grant in KIST funded by the Korean government (MSIT No. 20190004340011001). This research was partially supported by the National Research Foundation of Korea (NRF) grant funded by the Korean government (Grant No. 2018R1A2A1A05023214, MSIP), an Industry-Academy joint research program between Samsung Electronics and Yonsei University, the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (2016R1A6A1A03012877), and the Korean government (MSIT) (NRF-NRF-2019R1I1A1A01060334).
Publisher Copyright:
© 2021, The Author(s).
All Science Journal Classification (ASJC) codes
- General