Optical characterization of anatase TiO2 films patterned by direct ultraviolet-assisted nanoimprint lithography

Hyeong Ho Park, Xin Zhang, Soon Won Lee, Dong Joo Jeong, Sang Moo Lee, Ki Don Kim, Dae Geun Choi, Jun Hyuk Choi, Jihye Lee, Eung Sug Lee, Ho Kwan Kang, Hyung Ho Park, Ross H. Hill, Jun Ho Jeong

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Abstract

A direct ultraviolet (UV)-assisted nanoimprinting procedure using photosensitive titanium di-n-butoxide bis(2-ethylhexanoate) is employed in this study for the nanopatterning of anatase titanium dioxide (TiO2) structure. Upon annealing at 400 °C for 1 h, the lateral shrinkage and thickness shrinkage of the TiO2 nanostructure were 39.6% and 52.5%, respectively, which indicated an anisotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated TiO2 film is gradually increased by improvement in the packing density and crystallinity of the film. According to increasing UV exposure time and annealing temperature, the optical band gap (Eg) of UV-irradiated TiO2 film is red-shifted from 3.73 to 3.33 eV due to the formation of lattice defects, vacancies and voids during the photochemical reaction and due to the effect of quantum confinement during annealing treatment. These results suggest that the refractive index and optical Eg of TiO2 nanostructure could be controlled by tuning the UV exposure time and annealing treatment conditions. Nanopatterns of TiO2 fabricated by direct UV-assisted nanoimprint lithography are potential candidates for use in protective coatings for optical mirrors and filters, high-reflectivity mirrors, broadband interference filters and active electro-optical devices where ordered surface nanostructures could be necessary.

Original languageEnglish
Pages (from-to)923-928
Number of pages6
JournalMicroelectronic Engineering
Volume88
Issue number6
DOIs
Publication statusPublished - 2011 Jun

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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    Park, H. H., Zhang, X., Lee, S. W., Jeong, D. J., Lee, S. M., Kim, K. D., Choi, D. G., Choi, J. H., Lee, J., Lee, E. S., Kang, H. K., Park, H. H., Hill, R. H., & Jeong, J. H. (2011). Optical characterization of anatase TiO2 films patterned by direct ultraviolet-assisted nanoimprint lithography. Microelectronic Engineering, 88(6), 923-928. https://doi.org/10.1016/j.mee.2010.12.018