A direct ultraviolet (UV)-assisted nanoimprinting procedure using photosensitive titanium di-n-butoxide bis(2-ethylhexanoate) is employed in this study for the nanopatterning of anatase titanium dioxide (TiO2) structure. Upon annealing at 400 °C for 1 h, the lateral shrinkage and thickness shrinkage of the TiO2 nanostructure were 39.6% and 52.5%, respectively, which indicated an anisotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated TiO2 film is gradually increased by improvement in the packing density and crystallinity of the film. According to increasing UV exposure time and annealing temperature, the optical band gap (Eg) of UV-irradiated TiO2 film is red-shifted from 3.73 to 3.33 eV due to the formation of lattice defects, vacancies and voids during the photochemical reaction and due to the effect of quantum confinement during annealing treatment. These results suggest that the refractive index and optical Eg of TiO2 nanostructure could be controlled by tuning the UV exposure time and annealing treatment conditions. Nanopatterns of TiO2 fabricated by direct UV-assisted nanoimprint lithography are potential candidates for use in protective coatings for optical mirrors and filters, high-reflectivity mirrors, broadband interference filters and active electro-optical devices where ordered surface nanostructures could be necessary.
Bibliographical noteFunding Information:
This research was supported by a Grant ( 2009K000069 ) from the Center for Nanoscale Mechatronics and Manufacturing , one of the 21st Century Frontier Research Programs supported by the Ministry of Education, Science, and Technology of Korea. This research was supported by a National Platform Technology Grant ( 10033636 ) supported by the Ministry of the Knowledge Economy of Korea is also gratefully acknowledged.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering