Optimized grating formation for optoelectronic devices

Sang Kook Han; Bo Hun Choi

doi:10.1149/1.1837675

Optimized grating formation for optoelectronic devices

Sang Kook Han, Bo Hun Choi

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article

2 Citations (Scopus)

Abstract

We present an optimized grating formation process on InP substrates by using holographic lithography and a chemical etching. Process parameters associated with the developing and the etching were varied to ensure a reliable and reproducible fabrication condition. A quantitative experimental study of the variation of the grating shape with different fabrication conditions is presented and its optimization is discussed. 1.55 μm distributed feedback lasers were fabricated using an optimized grating formation process and lasing characteristics showed that the formed gratings are quite uniform and reproducible.

Original language	English
Pages (from-to)	1760-1764
Number of pages	5
Journal	Journal of the Electrochemical Society
Volume	144
Issue number	5
DOIs	https://doi.org/10.1149/1.1837675
Publication status	Published - 1997 Jan 1

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All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Renewable Energy, Sustainability and the Environment
Surfaces, Coatings and Films
Electrochemistry
Materials Chemistry

Cite this

Han, S. K., & Choi, B. H. (1997). Optimized grating formation for optoelectronic devices. Journal of the Electrochemical Society, 144(5), 1760-1764. https://doi.org/10.1149/1.1837675

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10.1149/1.1837675