Optimized grating formation for optoelectronic devices

Sang Kook Han, Bo Hun Choi

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We present an optimized grating formation process on InP substrates by using holographic lithography and a chemical etching. Process parameters associated with the developing and the etching were varied to ensure a reliable and reproducible fabrication condition. A quantitative experimental study of the variation of the grating shape with different fabrication conditions is presented and its optimization is discussed. 1.55 μm distributed feedback lasers were fabricated using an optimized grating formation process and lasing characteristics showed that the formed gratings are quite uniform and reproducible.

Original languageEnglish
Pages (from-to)1760-1764
Number of pages5
JournalJournal of the Electrochemical Society
Volume144
Issue number5
DOIs
Publication statusPublished - 1997 Jan 1

Fingerprint

Optoelectronic devices
Etching
Fabrication
Distributed feedback lasers
Lithography
Substrates

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

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Optimized grating formation for optoelectronic devices. / Han, Sang Kook; Choi, Bo Hun.

In: Journal of the Electrochemical Society, Vol. 144, No. 5, 01.01.1997, p. 1760-1764.

Research output: Contribution to journalArticle

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