Abstract
We present an optimized grating formation process on InP substrates by using holographic lithography and a chemical etching. Process parameters associated with the developing and the etching were varied to ensure a reliable and reproducible fabrication condition. A quantitative experimental study of the variation of the grating shape with different fabrication conditions is presented and its optimization is discussed. 1.55 μm distributed feedback lasers were fabricated using an optimized grating formation process and lasing characteristics showed that the formed gratings are quite uniform and reproducible.
| Original language | English |
|---|---|
| Pages (from-to) | 1760-1764 |
| Number of pages | 5 |
| Journal | Journal of the Electrochemical Society |
| Volume | 144 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1997 May |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Electrochemistry
- Materials Chemistry
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Han, S. K., & Choi, B. H. (1997). Optimized grating formation for optoelectronic devices. Journal of the Electrochemical Society, 144(5), 1760-1764. https://doi.org/10.1149/1.1837675