Abstract
We present an optimized grating formation process on InP substrates by using holographic lithography and a chemical etching. Process parameters associated with the developing and the etching were varied to ensure a reliable and reproducible fabrication condition. A quantitative experimental study of the variation of the grating shape with different fabrication conditions is presented and its optimization is discussed. 1.55 μm distributed feedback lasers were fabricated using an optimized grating formation process and lasing characteristics showed that the formed gratings are quite uniform and reproducible.
| Original language | English |
|---|---|
| Pages (from-to) | 1760-1764 |
| Number of pages | 5 |
| Journal | Journal of the Electrochemical Society |
| Volume | 144 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1997 Jan 1 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Electrochemistry
- Materials Chemistry
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Optimized grating formation for optoelectronic devices. / Han, Sang Kook; Choi, Bo Hun.
In: Journal of the Electrochemical Society, Vol. 144, No. 5, 01.01.1997, p. 1760-1764.Research output: Contribution to journal › Article
TY - JOUR
T1 - Optimized grating formation for optoelectronic devices
AU - Han, Sang Kook
AU - Choi, Bo Hun
PY - 1997/1/1
Y1 - 1997/1/1
N2 - We present an optimized grating formation process on InP substrates by using holographic lithography and a chemical etching. Process parameters associated with the developing and the etching were varied to ensure a reliable and reproducible fabrication condition. A quantitative experimental study of the variation of the grating shape with different fabrication conditions is presented and its optimization is discussed. 1.55 μm distributed feedback lasers were fabricated using an optimized grating formation process and lasing characteristics showed that the formed gratings are quite uniform and reproducible.
AB - We present an optimized grating formation process on InP substrates by using holographic lithography and a chemical etching. Process parameters associated with the developing and the etching were varied to ensure a reliable and reproducible fabrication condition. A quantitative experimental study of the variation of the grating shape with different fabrication conditions is presented and its optimization is discussed. 1.55 μm distributed feedback lasers were fabricated using an optimized grating formation process and lasing characteristics showed that the formed gratings are quite uniform and reproducible.
UR - http://www.scopus.com/inward/record.url?scp=0031142857&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0031142857&partnerID=8YFLogxK
U2 - 10.1149/1.1837675
DO - 10.1149/1.1837675
M3 - Article
AN - SCOPUS:0031142857
VL - 144
SP - 1760
EP - 1764
JO - Journal of the Electrochemical Society
JF - Journal of the Electrochemical Society
SN - 0013-4651
IS - 5
ER -