Optimum channel thickness of rubrene thin-film transistors

Jeong M. Choi, Seongil Im

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)


We report the influence of channel thickness on the field effect mobility of rubrene-based thin-film transistors (TFTs). Prior to crystallization annealing, amorphous (α) rubrene film was deposited under thickness conditions of 40, 50, 80, 120, and 160 nm by thermal evaporation on self-assembled-monolayer treated SiO2 / p+ -Si. Field effect mobility of the TFTs increased from almost 0 to 0.01 cm2 /V s with the rubrene channel thickness until it reaches to 120 nm because the rubrene crystallization on our substrate would not be perfect below 120 nm. The mobility decreased with the thickness over 120 nm due to parasitic resistance. We thus conclude that there exists an optimum channel thickness for rubrene TFTs.

Original languageEnglish
Article number043309
JournalApplied Physics Letters
Issue number4
Publication statusPublished - 2008

Bibliographical note

Funding Information:
This research was performed with the financial support from Information Display R&D Center, one of the 21st Century Frontier R&D Program funded by MKE and LG. Philips LCD (project year 2005). Authors also acknowledge the support from Seoul Science Fellowship and Brain Korea 21 Project.

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


Dive into the research topics of 'Optimum channel thickness of rubrene thin-film transistors'. Together they form a unique fingerprint.

Cite this