Ordered depth-first layouts for ray tracing

Jae Ho Nah, Jeong Soo Park, Jin Woo Kim, Chanmin Park, Tack Don Han

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

We present an ordered depth-first tree layout for ray tracing. Among two child nodes, a child node with the larger surface area is stored next to its parent node. Hence, the probabilities that a ray accesses to the same cache line increase. Our approach can be easily and widely used for various ray tracing systems with very small overheads, as it is based on existing depth-first layouts.

Original languageEnglish
Title of host publicationACM SIGGRAPH ASIA 2010 Sketches, SA'10
DOIs
Publication statusPublished - 2010 Dec 1
EventACM SIGGRAPH ASIA 2010 Sketches, SA'10 - Seoul, Korea, Republic of
Duration: 2010 Dec 152010 Dec 18

Publication series

NameACM SIGGRAPH ASIA 2010 Sketches, SA'10

Other

OtherACM SIGGRAPH ASIA 2010 Sketches, SA'10
CountryKorea, Republic of
CitySeoul
Period10/12/1510/12/18

All Science Journal Classification (ASJC) codes

  • Computer Graphics and Computer-Aided Design
  • Computer Vision and Pattern Recognition

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    Nah, J. H., Park, J. S., Kim, J. W., Park, C., & Han, T. D. (2010). Ordered depth-first layouts for ray tracing. In ACM SIGGRAPH ASIA 2010 Sketches, SA'10 [55] (ACM SIGGRAPH ASIA 2010 Sketches, SA'10). https://doi.org/10.1145/1899950.1900005