Abstract
Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.
| Original language | English |
|---|---|
| Pages (from-to) | 479-482 |
| Number of pages | 4 |
| Journal | Journal of Photopolymer Science and Technology |
| Volume | 31 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2018 Jan 1 |
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All Science Journal Classification (ASJC) codes
- Polymers and Plastics
- Organic Chemistry
- Materials Chemistry
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Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process. / Jung, Hyunsoo; Jun, Taesuk; Lee, Wooseop; Ryu, Du Yeol.
In: Journal of Photopolymer Science and Technology, Vol. 31, No. 4, 01.01.2018, p. 479-482.Research output: Contribution to journal › Article
TY - JOUR
T1 - Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process
AU - Jung, Hyunsoo
AU - Jun, Taesuk
AU - Lee, Wooseop
AU - Ryu, Du Yeol
PY - 2018/1/1
Y1 - 2018/1/1
N2 - Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.
AB - Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.
UR - http://www.scopus.com/inward/record.url?scp=85053144703&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85053144703&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.31.479
DO - 10.2494/photopolymer.31.479
M3 - Article
AN - SCOPUS:85053144703
VL - 31
SP - 479
EP - 482
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 4
ER -