Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process

Hyunsoo Jung; Taesuk Jun; Wooseop Lee; Du Yeol Ryu

doi:10.2494/photopolymer.31.479

Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process

Hyunsoo Jung, Taesuk Jun, Wooseop Lee, Du Yeol Ryu

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.

Original language	English
Pages (from-to)	479-482
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	31
Issue number	4
DOIs	https://doi.org/10.2494/photopolymer.31.479
Publication status	Published - 2018

Bibliographical note

Funding Information:
This research was supported by the NRF grants (2017R1A2A2A05001048, 2017R1A4A1014569) funded by the Ministry of Science, ICT & Future Planning (MSIP), Korea. Reference 1. J. Y. Cheng, C. A. Ross, V. Z. H. Chan, E. L.

All Science Journal Classification (ASJC) codes

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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title = "Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process",

abstract = "Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.",

author = "Hyunsoo Jung and Taesuk Jun and Wooseop Lee and Ryu, {Du Yeol}",

note = "Funding Information: This research was supported by the NRF grants (2017R1A2A2A05001048, 2017R1A4A1014569) funded by the Ministry of Science, ICT & Future Planning (MSIP), Korea. Reference 1. J. Y. Cheng, C. A. Ross, V. Z. H. Chan, E. L.",

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N1 - Funding Information: This research was supported by the NRF grants (2017R1A2A2A05001048, 2017R1A4A1014569) funded by the Ministry of Science, ICT & Future Planning (MSIP), Korea. Reference 1. J. Y. Cheng, C. A. Ross, V. Z. H. Chan, E. L.

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