Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process

Hyunsoo Jung, Taesuk Jun, Wooseop Lee, Du Yeol Ryu

Research output: Contribution to journalArticle

Abstract

Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.

Original languageEnglish
Pages (from-to)479-482
Number of pages4
JournalJournal of Photopolymer Science and Technology
Volume31
Issue number4
DOIs
Publication statusPublished - 2018 Jan 1

Fingerprint

Block copolymers
Nanostructures
Molecular weight
Vapors
Annealing
Polystyrenes
Polymethyl Methacrylate
Polymethyl methacrylates
Defects
Substrates

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

Cite this

@article{9b0f12dc110c414fa393e7f3b1ca0f95,
title = "Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process",
abstract = "Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.",
author = "Hyunsoo Jung and Taesuk Jun and Wooseop Lee and Ryu, {Du Yeol}",
year = "2018",
month = "1",
day = "1",
doi = "10.2494/photopolymer.31.479",
language = "English",
volume = "31",
pages = "479--482",
journal = "Journal of Photopolymer Science and Technology",
issn = "0914-9244",
publisher = "Tokai University",
number = "4",

}

Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process. / Jung, Hyunsoo; Jun, Taesuk; Lee, Wooseop; Ryu, Du Yeol.

In: Journal of Photopolymer Science and Technology, Vol. 31, No. 4, 01.01.2018, p. 479-482.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Ordering and orientation of giant nanostructures from high-molecular-weight block copolymer via solvent vapor annealing process

AU - Jung, Hyunsoo

AU - Jun, Taesuk

AU - Lee, Wooseop

AU - Ryu, Du Yeol

PY - 2018/1/1

Y1 - 2018/1/1

N2 - Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.

AB - Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.

UR - http://www.scopus.com/inward/record.url?scp=85053144703&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85053144703&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.31.479

DO - 10.2494/photopolymer.31.479

M3 - Article

AN - SCOPUS:85053144703

VL - 31

SP - 479

EP - 482

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

SN - 0914-9244

IS - 4

ER -