Ordering and orientation of high-molecular-weight (HMW) block copolymer (BCP) are challenging issues for recent technology to push the limit of nanoscopic size to hundreds-of-nanometers scale. HMW polystyrene-b-poly(methyl methacrylate)s (PS-b-PMMAs) were used to actualize larger feature sizes of giant lamellar and gyroid (GYR) nanostructures. The solvent vapor annealing (SVA) process was exploited to develop the long-range order nanostructures in the HMW BCP films. Directed orientation of nanostructures and the defect annihilation are discussed in terms of the interfacial interactions on the substrates and topographic trenches to design well-defined regular nanopatterns.
Bibliographical noteFunding Information:
This research was supported by the NRF grants (2017R1A2A2A05001048, 2017R1A4A1014569) funded by the Ministry of Science, ICT & Future Planning (MSIP), Korea. Reference 1. J. Y. Cheng, C. A. Ross, V. Z. H. Chan, E. L.
All Science Journal Classification (ASJC) codes
- Polymers and Plastics
- Organic Chemistry
- Materials Chemistry