Origin of bias-stress induced instability in organic thin-film transistors with semiconducting small-molecule/insulating polymer blend channel

Ji Hoon Park, Young Tack Lee, Hee Sung Lee, Jun Young Lee, Kimoon Lee, Gyu Baek Lee, Jiwon Han, Tae Woong Kim, Seongil Im

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

The stabilities of a blending type organic thin-film transistor with phase-separated TIPS-pentacene channel layer were characterized under the conditions of negative-bias-stress (NBS) and positive-bias-stress (PBS). During NBS, threshold voltage (Vth) shifts noticeably. NBS-imposed devices revealed interfacial trap density-of-states (DOS) at 1.56 and 1.66 eV, whereas initial device showed the DOS at only 1.56 eV, as measured by photoexcited charge-collection spectroscopy (PECCS) method. Possible origin of this newly created defect is related to ester group in PMMA, which induces some hole traps at the TIPS-pentacene/i-PMMA interface. PBS-imposed device showed little V th shift but visible off-current increase as "back-channel" effect, which is attributed to the water molecules trapped on the TFT surface.

Original languageEnglish
Pages (from-to)1625-1629
Number of pages5
JournalACS Applied Materials and Interfaces
Volume5
Issue number5
DOIs
Publication statusPublished - 2013 Mar 13

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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