Oxidation behavior of U3Si (3.9 wt% Si) in air at 250-400°C

Kweon Ho Kang, Keon Sik Kim, Kil Jeong Kim, Yongchil Seo, Young Moo Park

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The oxidation of U3Si was studied using a thermogravimetric analyzer and an XRD in the temperature range from 250 to 400°C in air. From XRD studies it was found that U3Si converted to UO2, U2O5 and Si after 200 h at temperatures up to 275°C and it converted to UO2, U3O7, SiO and SiO2 after 200 h at the temperature of 300°C. U3O8 began to be formed at the temperature of 325°C. The linear reaction rate was observed at lower temperatures up to 275°C in the experimental range of reaction time. For higher temperatures, however, the reaction rate was nearly linear at initial stage of reaction and more sharply increased after a certain time due to cracking, breaking and pulverizing in the specimen. The reaction was controlled by diffusion rather than chemical reaction kinetics. The averaged rate assuming a linear rate equation could be expressed with activation energies that were 122.29 kJ/mol and 69.65 kJ/mol the temperature ranges of 250 ≤ T(°C) ≤ 300 and 300 ≤ T(°C) ≤ 400 respectively.

Original languageEnglish
Pages (from-to)220-226
Number of pages7
JournalJournal of Nuclear Materials
Volume228
Issue number2
DOIs
Publication statusPublished - 1996 Jan 1

Fingerprint

reaction kinetics
Oxidation
oxidation
air
Air
grinding (comminution)
Temperature
temperature
Reaction rates
reaction time
analyzers
chemical reactions
Crack initiation
Reaction kinetics
activation energy
Chemical reactions
Activation energy

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Materials Science(all)

Cite this

Kang, Kweon Ho ; Kim, Keon Sik ; Kim, Kil Jeong ; Seo, Yongchil ; Park, Young Moo. / Oxidation behavior of U3Si (3.9 wt% Si) in air at 250-400°C. In: Journal of Nuclear Materials. 1996 ; Vol. 228, No. 2. pp. 220-226.
@article{5553a2848d0048bd9bdd623ae302ceaa,
title = "Oxidation behavior of U3Si (3.9 wt{\%} Si) in air at 250-400°C",
abstract = "The oxidation of U3Si was studied using a thermogravimetric analyzer and an XRD in the temperature range from 250 to 400°C in air. From XRD studies it was found that U3Si converted to UO2, U2O5 and Si after 200 h at temperatures up to 275°C and it converted to UO2, U3O7, SiO and SiO2 after 200 h at the temperature of 300°C. U3O8 began to be formed at the temperature of 325°C. The linear reaction rate was observed at lower temperatures up to 275°C in the experimental range of reaction time. For higher temperatures, however, the reaction rate was nearly linear at initial stage of reaction and more sharply increased after a certain time due to cracking, breaking and pulverizing in the specimen. The reaction was controlled by diffusion rather than chemical reaction kinetics. The averaged rate assuming a linear rate equation could be expressed with activation energies that were 122.29 kJ/mol and 69.65 kJ/mol the temperature ranges of 250 ≤ T(°C) ≤ 300 and 300 ≤ T(°C) ≤ 400 respectively.",
author = "Kang, {Kweon Ho} and Kim, {Keon Sik} and Kim, {Kil Jeong} and Yongchil Seo and Park, {Young Moo}",
year = "1996",
month = "1",
day = "1",
doi = "10.1016/S0022-3115(95)00216-2",
language = "English",
volume = "228",
pages = "220--226",
journal = "Journal of Nuclear Materials",
issn = "0022-3115",
publisher = "Elsevier",
number = "2",

}

Oxidation behavior of U3Si (3.9 wt% Si) in air at 250-400°C. / Kang, Kweon Ho; Kim, Keon Sik; Kim, Kil Jeong; Seo, Yongchil; Park, Young Moo.

In: Journal of Nuclear Materials, Vol. 228, No. 2, 01.01.1996, p. 220-226.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Oxidation behavior of U3Si (3.9 wt% Si) in air at 250-400°C

AU - Kang, Kweon Ho

AU - Kim, Keon Sik

AU - Kim, Kil Jeong

AU - Seo, Yongchil

AU - Park, Young Moo

PY - 1996/1/1

Y1 - 1996/1/1

N2 - The oxidation of U3Si was studied using a thermogravimetric analyzer and an XRD in the temperature range from 250 to 400°C in air. From XRD studies it was found that U3Si converted to UO2, U2O5 and Si after 200 h at temperatures up to 275°C and it converted to UO2, U3O7, SiO and SiO2 after 200 h at the temperature of 300°C. U3O8 began to be formed at the temperature of 325°C. The linear reaction rate was observed at lower temperatures up to 275°C in the experimental range of reaction time. For higher temperatures, however, the reaction rate was nearly linear at initial stage of reaction and more sharply increased after a certain time due to cracking, breaking and pulverizing in the specimen. The reaction was controlled by diffusion rather than chemical reaction kinetics. The averaged rate assuming a linear rate equation could be expressed with activation energies that were 122.29 kJ/mol and 69.65 kJ/mol the temperature ranges of 250 ≤ T(°C) ≤ 300 and 300 ≤ T(°C) ≤ 400 respectively.

AB - The oxidation of U3Si was studied using a thermogravimetric analyzer and an XRD in the temperature range from 250 to 400°C in air. From XRD studies it was found that U3Si converted to UO2, U2O5 and Si after 200 h at temperatures up to 275°C and it converted to UO2, U3O7, SiO and SiO2 after 200 h at the temperature of 300°C. U3O8 began to be formed at the temperature of 325°C. The linear reaction rate was observed at lower temperatures up to 275°C in the experimental range of reaction time. For higher temperatures, however, the reaction rate was nearly linear at initial stage of reaction and more sharply increased after a certain time due to cracking, breaking and pulverizing in the specimen. The reaction was controlled by diffusion rather than chemical reaction kinetics. The averaged rate assuming a linear rate equation could be expressed with activation energies that were 122.29 kJ/mol and 69.65 kJ/mol the temperature ranges of 250 ≤ T(°C) ≤ 300 and 300 ≤ T(°C) ≤ 400 respectively.

UR - http://www.scopus.com/inward/record.url?scp=0030109886&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030109886&partnerID=8YFLogxK

U2 - 10.1016/S0022-3115(95)00216-2

DO - 10.1016/S0022-3115(95)00216-2

M3 - Article

AN - SCOPUS:0030109886

VL - 228

SP - 220

EP - 226

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

SN - 0022-3115

IS - 2

ER -