Oxidation resistance of tantalum-ruthenium dioxide diffusion barrier for memory capacitor bottom electrodes

Dong Soo Yoon, Hong Koo Baik, Sung Man Lee, Chang Soo Park, Sang In Lee

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

The effect of the RuO2 addition into a Ta film on the oxidation resistance of a diffusion barrier for the Ta+RuO2/Si system was investigated. The Ta+RuO2/Si system was sustained up to 800°C without an increase in resistivity, while the Ta/Si structure completely degraded after annealing at 450°C. The Ta+RuO2 diffusion barrier showed an amorphous microstructure for an as-deposited state and formed a conductive RuO2 phase after annealing. Ta was sufficiently bound to oxygen of RuO2 for an as-deposited state, but RuO2 was divided into Ru and Ru-O binding states. Ta-O bonds showed a little change compared to the as-deposited state with increasing annealing temperature, whereas Ru-O bonds significantly increased. Therefore, the Ta layer deposited by the RuO2 addition effectively prevented the indiffusion of oxygen up to 800°C and its oxidation resistance was superior to those of polycrystalline nitride (TiN, TaN) and ternary amorphous (TaSiN) barriers reported by others.

Original languageEnglish
Pages (from-to)324-326
Number of pages3
JournalApplied Physics Letters
Volume73
Issue number3
DOIs
Publication statusPublished - 1998 Dec 1

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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