Oxide semiconductor TFTs for the next generation LCD-TV applications

Je Hun Lee, Do Hyun Kim, Dong Ju Yang, Sun Young Hong, Kap Soo Yoon, Pil Soon Hong, Chang Oh Jeong, Geun Lee Woo, Jin Ho Song, Yul Kim Shi, Soo Kim Sang, Kyoung Seok Son, Tae Sang Kim, Jang Yeon Kwon, Sang Yoon Lee

Research output: Contribution to journalConference article

Abstract

For a large sized, ultra definition (UD) and high refresh rate for motion blur free AMLCD TVs, amorphous IGZO thin film transistor (TFT) are applied and investigated in terms of threshold voltage (Vth) shift influenced by active layer thickness uniformity, source drain etching technology, heat treatment and passivation condition. Optimizing above parameters, we fabricated the world's largest 15 inch XGA AMLCD successfully.

Original languageEnglish
Pages (from-to)1203-1207
Number of pages5
JournalProceedings of International Meeting on Information Display
Volume8
Publication statusPublished - 2008 Dec 1
Event8th International Meeting on Information Display - International Display Manufacturing Conference 2008 and Asia Display 2008, IMID/IDMC/ASIA DISPLAY 2008 - Ilsan, Korea, Republic of
Duration: 2008 Oct 132008 Oct 17

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All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Lee, J. H., Kim, D. H., Yang, D. J., Hong, S. Y., Yoon, K. S., Hong, P. S., Jeong, C. O., Woo, G. L., Song, J. H., Shi, Y. K., Sang, S. K., Son, K. S., Kim, T. S., Kwon, J. Y., & Lee, S. Y. (2008). Oxide semiconductor TFTs for the next generation LCD-TV applications. Proceedings of International Meeting on Information Display, 8, 1203-1207.