TY - GEN
T1 - Oxide tft fabrication techniques for advanced flexible display backplanes
AU - Na, Jae Won
AU - Kim, Hee Jun
AU - Kang, Byung Ha
AU - Kim, Hyun Jae
N1 - Publisher Copyright:
© 2017 Proceedings of the International Display Workshops. All rights reserved.
Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.
PY - 2017
Y1 - 2017
N2 - We propose low-temperature fabricated amorphous oxide semiconductor thin film transistors (AOS TFTs) by simultaneous ultraviolet and thermal (SUT), electrically assisted thermal (EAT), and high pressum annealing (HPA) treatments. In addition, we investigated a new material, nitrocellulose, as a low-temperature processale passivation layer of oxide TFTs.
AB - We propose low-temperature fabricated amorphous oxide semiconductor thin film transistors (AOS TFTs) by simultaneous ultraviolet and thermal (SUT), electrically assisted thermal (EAT), and high pressum annealing (HPA) treatments. In addition, we investigated a new material, nitrocellulose, as a low-temperature processale passivation layer of oxide TFTs.
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M3 - Conference contribution
AN - SCOPUS:85056287232
T3 - Proceedings of the International Display Workshops
SP - 332
EP - 335
BT - 24th International Display Workshops, IDW 2017
PB - International Display Workshops
T2 - 24th International Display Workshops, IDW 2017
Y2 - 6 December 2017 through 8 December 2017
ER -