Oxide tft fabrication techniques for advanced flexible display backplanes

Jae Won Na, Hee Jun Kim, Byung Ha Kang, Hyun Jae Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We propose low-temperature fabricated amorphous oxide semiconductor thin film transistors (AOS TFTs) by simultaneous ultraviolet and thermal (SUT), electrically assisted thermal (EAT), and high pressum annealing (HPA) treatments. In addition, we investigated a new material, nitrocellulose, as a low-temperature processale passivation layer of oxide TFTs.

Original languageEnglish
Title of host publication24th International Display Workshops, IDW 2017
PublisherInternational Display Workshops
Pages332-335
Number of pages4
ISBN (Electronic)9781510858992
Publication statusPublished - 2017 Jan 1
Event24th International Display Workshops, IDW 2017 - Sendai, Japan
Duration: 2017 Dec 62017 Dec 8

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Other

Other24th International Display Workshops, IDW 2017
CountryJapan
CitySendai
Period17/12/617/12/8

All Science Journal Classification (ASJC) codes

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

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  • Cite this

    Na, J. W., Kim, H. J., Kang, B. H., & Kim, H. J. (2017). Oxide tft fabrication techniques for advanced flexible display backplanes. In 24th International Display Workshops, IDW 2017 (pp. 332-335). (Proceedings of the International Display Workshops; Vol. 1). International Display Workshops.