P-14: High performance solution-processed IGZO TFTs formed by using a high-pressure annealing method

You Seung Rim, Dong Lim Kim, Woong Hee Jeong, Hyun Soo Shin, Hyun Jae Kim

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We have developed a noble high-pressure annealing (HPA) method for solution-processed indium gallium zinc oxide (IGZO) thin-film transistors (TFTs). As the pressure increased, the electrical properties of solution-processed IGZO TFTs were improved. This could be attributed to the decomposition promotion of metal-organic bonding and the density decrease of interface defect states between IGZO channel and SiO2 gate insulator. For the IGZO channel layer annealed for 3 h at 1 MPa and 300 oC, its channel mobility (μFE), threshold voltage (Vth), subthreshold gate swing (S.S) and on/off ratio were 1.02 cm2/Vs, 2.47 V, 0.48 V/dec. and 7.5×106, respectively.

Original languageEnglish
Pages (from-to)1148-1150
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume42 1
DOIs
Publication statusPublished - 2011 Jun

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Fingerprint Dive into the research topics of 'P-14: High performance solution-processed IGZO TFTs formed by using a high-pressure annealing method'. Together they form a unique fingerprint.

  • Cite this