Patterned pyroelectric electron emitters and their feasibility study for lithography applications

Chang Wook Moon, Dong Wook Kim, G. Rosenman, Tae Kuk Ko, In K. Yoo

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Abstract

Patterned electron emitters were fabricated using LiNbO3 (LN) single crystals and their characteristics were investigated for electron-beam lithography applications. Pyroelectrically induced electron emission was suppressed by coating Pt and Ti thin films. However, the electron emission behaviors were not affected by the deposition of SiO2 dielectric layers. Based on these observations, a structure of patterned emitters was suggested; Ti layers and SiO2 layers were used as blocking layers and emission layers, respectively. By using a 1:1 electron beam projection system, 100 μm and 5 μm dots on the exposed resist were obtained from 300 μm and 30 μm dots on emitters. Reduction of patterns might be useful in obtaining fine patterns without complex electron optics.

Original languageEnglish
Pages (from-to)3523-3525
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number6 A
Publication statusPublished - 2003 Jun 1

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All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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