Patterned pyroelectric electron emitters and their feasibility study for lithography applications

Chang Wook Moon, Dong Wook Kim, G. Rosenman, Tae Kuk Ko, In K. Yoo

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Patterned electron emitters were fabricated using LiNbO3 (LN) single crystals and their characteristics were investigated for electron-beam lithography applications. Pyroelectrically induced electron emission was suppressed by coating Pt and Ti thin films. However, the electron emission behaviors were not affected by the deposition of SiO2 dielectric layers. Based on these observations, a structure of patterned emitters was suggested; Ti layers and SiO2 layers were used as blocking layers and emission layers, respectively. By using a 1:1 electron beam projection system, 100 μm and 5 μm dots on the exposed resist were obtained from 300 μm and 30 μm dots on emitters. Reduction of patterns might be useful in obtaining fine patterns without complex electron optics.

Original languageEnglish
Pages (from-to)3523-3525
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number6 A
Publication statusPublished - 2003 Jun 1

Fingerprint

Electron emission
Lithography
emitters
lithography
Electron optics
Projection systems
Electrons
Electron beam lithography
Electron beams
electrons
electron emission
Single crystals
Thin films
Coatings
electron beams
electron optics
projection
coatings
single crystals
thin films

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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abstract = "Patterned electron emitters were fabricated using LiNbO3 (LN) single crystals and their characteristics were investigated for electron-beam lithography applications. Pyroelectrically induced electron emission was suppressed by coating Pt and Ti thin films. However, the electron emission behaviors were not affected by the deposition of SiO2 dielectric layers. Based on these observations, a structure of patterned emitters was suggested; Ti layers and SiO2 layers were used as blocking layers and emission layers, respectively. By using a 1:1 electron beam projection system, 100 μm and 5 μm dots on the exposed resist were obtained from 300 μm and 30 μm dots on emitters. Reduction of patterns might be useful in obtaining fine patterns without complex electron optics.",
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Patterned pyroelectric electron emitters and their feasibility study for lithography applications. / Moon, Chang Wook; Kim, Dong Wook; Rosenman, G.; Ko, Tae Kuk; Yoo, In K.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 42, No. 6 A, 01.06.2003, p. 3523-3525.

Research output: Contribution to journalArticle

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AU - Kim, Dong Wook

AU - Rosenman, G.

AU - Ko, Tae Kuk

AU - Yoo, In K.

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