Patterning microconductor using nanosecond laser ablation of metal nanoparticle film

Sewoon Han; Taewong Lim; Jaewon Chung; Seung H. Ko; Costas P. Grigoropoulos; Dongjo Kim; Jooho Moon

doi:10.1117/12.701533

Patterning microconductor using nanosecond laser ablation of metal nanoparticle film

Sewoon Han, Taewong Lim, Jaewon Chung, Seung H. Ko, Costas P. Grigoropoulos, Dongjo Kim, Jooho Moon

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Ablation of metal nanoparticle film using frequency doubled Nd:YAG nanosecond laser is explored to apply for trimming drop on demand (DOD) Inkjet printed electrical micro-conductor for flexible electronics. While elevated rim structure due to expulsion of molten pool is observed in sintered nanoparticle film, the ablation of unsintered nanoparticle film results in a Gaussian-shaped ablation profile, so that a clean precise patterning is possible. In addition, the ablation fluence threshold of unsintered metal nanoparticle film is at least ten times lower than that of a corresponding metal film. Therefore, by using nanosecond laser ablation, inkjet printed metal nanoparticles compatible for flexible polymer can be patterned efficiently with a high resolution.

Original language	English
Title of host publication	Photon Processing in Microelectronics and Photonics VI
DOIs	https://doi.org/10.1117/12.701533
Publication status	Published - 2007
Event	Photon Processing in Microelectronics and Photonics VI - San Jose, CA, United States Duration: 2007 Jan 22 → 2007 Jan 25

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6458
ISSN (Print)	0277-786X

Other

Other	Photon Processing in Microelectronics and Photonics VI
Country/Territory	United States
City	San Jose, CA
Period	07/1/22 → 07/1/25

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.701533

Cite this

@inproceedings{7832fb53631f49359b11516c67d64145,

title = "Patterning microconductor using nanosecond laser ablation of metal nanoparticle film",

abstract = "Ablation of metal nanoparticle film using frequency doubled Nd:YAG nanosecond laser is explored to apply for trimming drop on demand (DOD) Inkjet printed electrical micro-conductor for flexible electronics. While elevated rim structure due to expulsion of molten pool is observed in sintered nanoparticle film, the ablation of unsintered nanoparticle film results in a Gaussian-shaped ablation profile, so that a clean precise patterning is possible. In addition, the ablation fluence threshold of unsintered metal nanoparticle film is at least ten times lower than that of a corresponding metal film. Therefore, by using nanosecond laser ablation, inkjet printed metal nanoparticles compatible for flexible polymer can be patterned efficiently with a high resolution.",

author = "Sewoon Han and Taewong Lim and Jaewon Chung and Ko, {Seung H.} and Grigoropoulos, {Costas P.} and Dongjo Kim and Jooho Moon",

year = "2007",

doi = "10.1117/12.701533",

language = "English",

isbn = "0819465712",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Photon Processing in Microelectronics and Photonics VI",

note = "Photon Processing in Microelectronics and Photonics VI ; Conference date: 22-01-2007 Through 25-01-2007",

}

Han, S, Lim, T, Chung, J, Ko, SH, Grigoropoulos, CP, Kim, D & Moon, J 2007, Patterning microconductor using nanosecond laser ablation of metal nanoparticle film. in Photon Processing in Microelectronics and Photonics VI., 645811, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6458, Photon Processing in Microelectronics and Photonics VI, San Jose, CA, United States, 07/1/22. https://doi.org/10.1117/12.701533

Patterning microconductor using nanosecond laser ablation of metal nanoparticle film. / Han, Sewoon; Lim, Taewong; Chung, Jaewon et al.

Photon Processing in Microelectronics and Photonics VI. 2007. 645811 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6458).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Patterning microconductor using nanosecond laser ablation of metal nanoparticle film

AU - Han, Sewoon

AU - Lim, Taewong

AU - Chung, Jaewon

AU - Ko, Seung H.

AU - Grigoropoulos, Costas P.

AU - Kim, Dongjo

AU - Moon, Jooho

PY - 2007

Y1 - 2007

N2 - Ablation of metal nanoparticle film using frequency doubled Nd:YAG nanosecond laser is explored to apply for trimming drop on demand (DOD) Inkjet printed electrical micro-conductor for flexible electronics. While elevated rim structure due to expulsion of molten pool is observed in sintered nanoparticle film, the ablation of unsintered nanoparticle film results in a Gaussian-shaped ablation profile, so that a clean precise patterning is possible. In addition, the ablation fluence threshold of unsintered metal nanoparticle film is at least ten times lower than that of a corresponding metal film. Therefore, by using nanosecond laser ablation, inkjet printed metal nanoparticles compatible for flexible polymer can be patterned efficiently with a high resolution.

AB - Ablation of metal nanoparticle film using frequency doubled Nd:YAG nanosecond laser is explored to apply for trimming drop on demand (DOD) Inkjet printed electrical micro-conductor for flexible electronics. While elevated rim structure due to expulsion of molten pool is observed in sintered nanoparticle film, the ablation of unsintered nanoparticle film results in a Gaussian-shaped ablation profile, so that a clean precise patterning is possible. In addition, the ablation fluence threshold of unsintered metal nanoparticle film is at least ten times lower than that of a corresponding metal film. Therefore, by using nanosecond laser ablation, inkjet printed metal nanoparticles compatible for flexible polymer can be patterned efficiently with a high resolution.

UR - http://www.scopus.com/inward/record.url?scp=34248590616&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34248590616&partnerID=8YFLogxK

U2 - 10.1117/12.701533

DO - 10.1117/12.701533

M3 - Conference contribution

AN - SCOPUS:34248590616

SN - 0819465712

SN - 9780819465719

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Photon Processing in Microelectronics and Photonics VI

T2 - Photon Processing in Microelectronics and Photonics VI

Y2 - 22 January 2007 through 25 January 2007

ER -

Patterning microconductor using nanosecond laser ablation of metal nanoparticle film

Abstract

Publication series

Other

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this