Performance enhancement of IPMC by anisotropic Plasma etching process

Seok Hwan Lee, Chul Jin Kim, Hyun Woo Hwang, Sung Joo Kim, Hyun Seok Yang, No Cheo Park, Young Pil Park, Kang Ho Park, Hyung Kun Lee, Nak Jin Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Ionic Polymer-Metal Composites (IPMCs) of EAP actuators is famous for its good property of response and durability. The performance of Ionic Polymer-Metal Composites (IPMCs) is an important issue which is affected by many factors. There are two factors for deciding the performance of IPMC. By treating anisotropic plasma etching process to 6 models of the IPMCs, enhanced experimental displacement and force results are obtained. Plasma patterning processes are executed by changing the groove and the land length of 6 patterns. The purpose of the present investigation is to find out the major factor which mainly affects the IPMC performance. Simulations using ANSYS have been executed to compare with the experimental results about the values and the tendency of data. Experimental and simulating data of the performances seem to have similar tendency. In the next part of the paper, we observed the other properties like capacitance, resistance and stiffness of 6 plasma patterned IPMCs. And we observed that the stiffness is the major factor which affects the performance of IPMCs. As we seen, our problem has been reduced to investigate about the property of stiffness. We suggest that the stiffness is largely changed mainly because of the different thickness of Platinum stacked of the groove and the land part which are produced by anisotropic plasma etching processes. And we understand that anisotropic plasma patterned IPMCs of better performance can be applied to various applications.

Original languageEnglish
Title of host publicationElectroactive Polymer Actuators and Devices (EAPAD) 2009
DOIs
Publication statusPublished - 2009
EventElectroactive Polymer Actuators and Devices (EAPAD) 2009 - San Diego, CA, United States
Duration: 2009 Mar 92009 Mar 12

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7287
ISSN (Print)0277-786X

Other

OtherElectroactive Polymer Actuators and Devices (EAPAD) 2009
CountryUnited States
CitySan Diego, CA
Period09/3/909/3/12

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Lee, S. H., Kim, C. J., Hwang, H. W., Kim, S. J., Yang, H. S., Park, N. C., Park, Y. P., Park, K. H., Lee, H. K., & Choi, N. J. (2009). Performance enhancement of IPMC by anisotropic Plasma etching process. In Electroactive Polymer Actuators and Devices (EAPAD) 2009 [728722] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7287). https://doi.org/10.1117/12.815685