Photo-induced hybrid nanopatterning of titanium dioxide via direct imprint lithography

Hyeong Ho Park, Dae Geun Choi, Xin Zhang, Sohee Jeon, Seong Je Park, Soon Won Lee, Sarah Kim, Ki Don Kim, Jun Hyuk Choi, Jihye Lee, Dae Keun Yun, Ki Joong Lee, Hyung-Ho Park, Ross Henry Hill, Jun Ho Jeong

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive titanium(iv) di-n-butoxide bis(2-ethylhexanoate) is presented for the fabrication of well-ordered titanium dioxide (TiO 2 ) nanostructures at room temperature. The main novelty of this technique is the use of the photosensitive titanium organic compound, rather than a commonly used UV-curable resin, for direct UV-assisted nanoimprint lithography. Fourier transform infrared and X-ray photoelectron spectroscopy studies suggest that exposure to UV light resulted in the gradual removal of organic groups from films prepared from titanium(iv) di-n-butoxide bis(2-ethylhexanoate) photochemically and successively converted the films to TiO 2 at room temperature. This approach allows direct fabrication of TiO 2 nanopatterns with lines down to 35 nm in width, hole arrays of 265 nm in diameter, and three-dimensional TiO 2 hybrid micro/nano-patterns without observable defects for use in applications where ordered surface nanostructures are required, such as photovoltaics, photonics, and optical waveguides.

Original languageEnglish
Pages (from-to)1921-1926
Number of pages6
JournalJournal of Materials Chemistry
Volume20
Issue number10
DOIs
Publication statusPublished - 2010 Mar 1

Fingerprint

Titanium
Titanium dioxide
Lithography
Nanostructures
Nanoimprint lithography
Fabrication
Optical waveguides
Organic compounds
Photonics
Fourier transforms
X ray photoelectron spectroscopy
Resins
Infrared radiation
Temperature
Defects
titanium dioxide

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Chemistry

Cite this

Park, H. H., Choi, D. G., Zhang, X., Jeon, S., Park, S. J., Lee, S. W., ... Jeong, J. H. (2010). Photo-induced hybrid nanopatterning of titanium dioxide via direct imprint lithography. Journal of Materials Chemistry, 20(10), 1921-1926. https://doi.org/10.1039/b921343k
Park, Hyeong Ho ; Choi, Dae Geun ; Zhang, Xin ; Jeon, Sohee ; Park, Seong Je ; Lee, Soon Won ; Kim, Sarah ; Kim, Ki Don ; Choi, Jun Hyuk ; Lee, Jihye ; Yun, Dae Keun ; Lee, Ki Joong ; Park, Hyung-Ho ; Hill, Ross Henry ; Jeong, Jun Ho. / Photo-induced hybrid nanopatterning of titanium dioxide via direct imprint lithography. In: Journal of Materials Chemistry. 2010 ; Vol. 20, No. 10. pp. 1921-1926.
@article{d24dce5265054c5394e999accadeb49c,
title = "Photo-induced hybrid nanopatterning of titanium dioxide via direct imprint lithography",
abstract = "A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive titanium(iv) di-n-butoxide bis(2-ethylhexanoate) is presented for the fabrication of well-ordered titanium dioxide (TiO 2 ) nanostructures at room temperature. The main novelty of this technique is the use of the photosensitive titanium organic compound, rather than a commonly used UV-curable resin, for direct UV-assisted nanoimprint lithography. Fourier transform infrared and X-ray photoelectron spectroscopy studies suggest that exposure to UV light resulted in the gradual removal of organic groups from films prepared from titanium(iv) di-n-butoxide bis(2-ethylhexanoate) photochemically and successively converted the films to TiO 2 at room temperature. This approach allows direct fabrication of TiO 2 nanopatterns with lines down to 35 nm in width, hole arrays of 265 nm in diameter, and three-dimensional TiO 2 hybrid micro/nano-patterns without observable defects for use in applications where ordered surface nanostructures are required, such as photovoltaics, photonics, and optical waveguides.",
author = "Park, {Hyeong Ho} and Choi, {Dae Geun} and Xin Zhang and Sohee Jeon and Park, {Seong Je} and Lee, {Soon Won} and Sarah Kim and Kim, {Ki Don} and Choi, {Jun Hyuk} and Jihye Lee and Yun, {Dae Keun} and Lee, {Ki Joong} and Hyung-Ho Park and Hill, {Ross Henry} and Jeong, {Jun Ho}",
year = "2010",
month = "3",
day = "1",
doi = "10.1039/b921343k",
language = "English",
volume = "20",
pages = "1921--1926",
journal = "Journal of Materials Chemistry",
issn = "0959-9428",
publisher = "Royal Society of Chemistry",
number = "10",

}

Park, HH, Choi, DG, Zhang, X, Jeon, S, Park, SJ, Lee, SW, Kim, S, Kim, KD, Choi, JH, Lee, J, Yun, DK, Lee, KJ, Park, H-H, Hill, RH & Jeong, JH 2010, 'Photo-induced hybrid nanopatterning of titanium dioxide via direct imprint lithography', Journal of Materials Chemistry, vol. 20, no. 10, pp. 1921-1926. https://doi.org/10.1039/b921343k

Photo-induced hybrid nanopatterning of titanium dioxide via direct imprint lithography. / Park, Hyeong Ho; Choi, Dae Geun; Zhang, Xin; Jeon, Sohee; Park, Seong Je; Lee, Soon Won; Kim, Sarah; Kim, Ki Don; Choi, Jun Hyuk; Lee, Jihye; Yun, Dae Keun; Lee, Ki Joong; Park, Hyung-Ho; Hill, Ross Henry; Jeong, Jun Ho.

In: Journal of Materials Chemistry, Vol. 20, No. 10, 01.03.2010, p. 1921-1926.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Photo-induced hybrid nanopatterning of titanium dioxide via direct imprint lithography

AU - Park, Hyeong Ho

AU - Choi, Dae Geun

AU - Zhang, Xin

AU - Jeon, Sohee

AU - Park, Seong Je

AU - Lee, Soon Won

AU - Kim, Sarah

AU - Kim, Ki Don

AU - Choi, Jun Hyuk

AU - Lee, Jihye

AU - Yun, Dae Keun

AU - Lee, Ki Joong

AU - Park, Hyung-Ho

AU - Hill, Ross Henry

AU - Jeong, Jun Ho

PY - 2010/3/1

Y1 - 2010/3/1

N2 - A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive titanium(iv) di-n-butoxide bis(2-ethylhexanoate) is presented for the fabrication of well-ordered titanium dioxide (TiO 2 ) nanostructures at room temperature. The main novelty of this technique is the use of the photosensitive titanium organic compound, rather than a commonly used UV-curable resin, for direct UV-assisted nanoimprint lithography. Fourier transform infrared and X-ray photoelectron spectroscopy studies suggest that exposure to UV light resulted in the gradual removal of organic groups from films prepared from titanium(iv) di-n-butoxide bis(2-ethylhexanoate) photochemically and successively converted the films to TiO 2 at room temperature. This approach allows direct fabrication of TiO 2 nanopatterns with lines down to 35 nm in width, hole arrays of 265 nm in diameter, and three-dimensional TiO 2 hybrid micro/nano-patterns without observable defects for use in applications where ordered surface nanostructures are required, such as photovoltaics, photonics, and optical waveguides.

AB - A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive titanium(iv) di-n-butoxide bis(2-ethylhexanoate) is presented for the fabrication of well-ordered titanium dioxide (TiO 2 ) nanostructures at room temperature. The main novelty of this technique is the use of the photosensitive titanium organic compound, rather than a commonly used UV-curable resin, for direct UV-assisted nanoimprint lithography. Fourier transform infrared and X-ray photoelectron spectroscopy studies suggest that exposure to UV light resulted in the gradual removal of organic groups from films prepared from titanium(iv) di-n-butoxide bis(2-ethylhexanoate) photochemically and successively converted the films to TiO 2 at room temperature. This approach allows direct fabrication of TiO 2 nanopatterns with lines down to 35 nm in width, hole arrays of 265 nm in diameter, and three-dimensional TiO 2 hybrid micro/nano-patterns without observable defects for use in applications where ordered surface nanostructures are required, such as photovoltaics, photonics, and optical waveguides.

UR - http://www.scopus.com/inward/record.url?scp=77249150478&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77249150478&partnerID=8YFLogxK

U2 - 10.1039/b921343k

DO - 10.1039/b921343k

M3 - Article

AN - SCOPUS:77249150478

VL - 20

SP - 1921

EP - 1926

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

SN - 0959-9428

IS - 10

ER -