Photoalignment material of high thermal resistance with hydroxyl aromatic polyimide for liquid crystal display

Whee Won Lee, Jeoung Yeon Hwang, Myon Kil Choi, Dong Hack Suh, Dae Shik Seo

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

We synthesized photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below 1°. The voltage-transmittance curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms. The residual DC voltage of photoaligned TN cell will be discussed.

Original languageEnglish
Pages (from-to)51-61
Number of pages11
JournalFerroelectrics
Volume344
DOIs
Publication statusPublished - 2006 Dec 1
Event2005 International Meeting on Ferroelectricity, IMF-11 - , Argentina
Duration: 2005 Sep 52005 Sep 9

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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