Photocatalytic activities of TiO 2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

Chang Soo Lee, Jungwon Kim, Gil Ho Gu, Du Hwan Jo, Chan Gyung Park, Wonyong Choi, Hyungjun Kim

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Titanium dioxide (TiO 2 ) thin films were prepared on Galvanized Iron (GI) substrate by plasma-enhanced atomic layer deposition (PE-ALD) using tetrakis-dimethylamido titanium and O 2 plasma to investigate the photocatalytic activities. The PE-ALD TiO 2 thin films exhibited relatively high growth rate and the crystal structures of TiO 2 thin films depended on the growth temperatures. TiO 2 thin films deposited at 200 °C have amorphous phase, whereas those with anatase phase and bandgap energy about 3.2 eV were deposited at growth temperature of 250 °C and 300 °C. From contact angles measurement of water droplet, TiO 2 thin films with anatase phase and Activ™ glass exhibited superhydrophilic surfaces after UV light exposure. And from photo-induced degradation test of organic solution, anatase TiO 2 thin films and Activ™ glass decomposed organic solution under UV illumination. The anatase TiO 2 thin film on GI substrate showed higher photocatalytic efficiency than Activ™ glass after 5 h UV light exposure. Thus, we suggest that the anatase phase in TiO 2 thin film contributes to both superhydrophilicity and photocatalytic decomposition of 4-chlorophenol solution and anatase TiO 2 thin films are suitable for self-cleaning applications.

Original languageEnglish
Pages (from-to)4757-4761
Number of pages5
JournalThin Solid Films
Volume518
Issue number17
DOIs
Publication statusPublished - 2010 Jun 30

Fingerprint

Atomic layer deposition
atomic layer epitaxy
Iron
Titanium dioxide
Plasmas
iron
anatase
Thin films
Substrates
thin films
Growth temperature
Ultraviolet radiation
Glass
glass
Angle measurement
titanium dioxide
titanium oxides
cleaning
Contact angle
Cleaning

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Lee, Chang Soo ; Kim, Jungwon ; Gu, Gil Ho ; Jo, Du Hwan ; Park, Chan Gyung ; Choi, Wonyong ; Kim, Hyungjun. / Photocatalytic activities of TiO 2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition In: Thin Solid Films. 2010 ; Vol. 518, No. 17. pp. 4757-4761.
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Photocatalytic activities of TiO 2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition . / Lee, Chang Soo; Kim, Jungwon; Gu, Gil Ho; Jo, Du Hwan; Park, Chan Gyung; Choi, Wonyong; Kim, Hyungjun.

In: Thin Solid Films, Vol. 518, No. 17, 30.06.2010, p. 4757-4761.

Research output: Contribution to journalArticle

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