Photocatalytic activities of TiO₂ thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

Engineering

• Thin Films 100%
• Atomic Layer Deposition 30%
• Growth Temperature 20%
• Contact Angle Measurement 10%
• Crystal Structure 10%
• High Growth Rate 10%
• Titanium Dioxide (Tio2) 10%
• Amorphous Phase 10%
• Induced Degradation 10%

Chemistry

• Titanium Dioxide 60%
• Atomic Layer Epitaxy 30%
• Photocatalytic Activity 20%
• Crystal Structure 10%
• Illumination 10%
• Band Gap 10%
• Decomposition 10%
• 4-Chlorophenol 10%

Material Science

• Thin Films 100%
• Droplet 10%