We prepared photocatalytic TiO2 thin films which exhibited relatively high growth rate and low impurity on polymer substrate by plasma enhanced atomic layer deposition (PE-ALD) from Ti(NMe2)4 [tetrakis (dimethylamido) Ti, TDMAT] and O2 plasma to show the self-cleaning effect. The TiO2 thin films with anatase phase and bandgap energy about 3.3 eV were deposited at growth temperature of 250 °C and the photocatalytic effects were compared with commercial Activ glass. From contact angles measurement of water droplet and photo-induced degradation test of organic liquid, TiO2 thin films with anatase phases showed superhydrophilic phenomena and decomposed organic liquid after UV irradiation. The anatase TiO2 thin film on polymer substrate showed highest photocatalytic efficiency after 5 h UV irradiation. We attribute the highest photocatalytic efficiency of TiO2 thin film with anatase structure to the formation of suitable crystalline phase and large surface area.
Bibliographical noteFunding Information:
This work was supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD) (KRF-2008-005-J00501) and Korea Ministry of Commerce, Industry and Energy (System IC 2010, Commercialization Program of Nano Process Equipments). And one of the authors (Chang-Soo Lee) was financially supported by the second stage of the Brain Korea 21 project in 2008.
All Science Journal Classification (ASJC) codes
- Environmental Science(all)
- Process Chemistry and Technology