Photoinduced Low Refractive Index Patterning in a Photosensitive Hybrid Material

Jang Ung Park, Eun Seok Kang, Byeong Soo Bae

Research output: Contribution to journalConference article

Abstract

Light illumination processing created photoinduced reduction of refractive index as well as volume contraction in an organic-inorganic hybrid material. Whereas both refractive index and film thickness are decreased significantly by the light exposure, transmittance and anti-soiling property of the hybrid film are not affected by the exposure. Direct patterning is possible upon light illumination using the photoinduced change in thickness without any developing process.

Original languageEnglish
Pages (from-to)105-110
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume780
DOIs
Publication statusPublished - 2003
EventMATERIALS RESEARCH SOCIETY SYMPOSIUM - PROCEEDINGS: Advanced Optical Processing of Materials - San Francisco, CA, United States
Duration: 2003 Apr 222003 Apr 23

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Photoinduced Low Refractive Index Patterning in a Photosensitive Hybrid Material'. Together they form a unique fingerprint.

  • Cite this