Photoresist-free lithographic patterning of solution-processed nanostructured metal thin films

Hyunkwon Shin, Hyunjun Kim, Hyeongjae Lee, Hyeonggeun Yoo, Jinsoo Kim, Hyoungsub Kim, Myeongkyu Lee

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A study was conducted to demonstrate photoresist-free lithographic patterning of solution-processed nanostructured metal thin films. The approach used in the study utilizes the interaction of a pulsed laser with solution-processed metal thin films. The study demonstrated that silver thin films deposited on transparent substrates can be directly patterned by a Nd:YAG-pulsed laser, without using a photoresist layer. It was observed that a laser pulse impinging on the film/substrate interface generates a thermoelastic force into the film and that a moderate cohesion of the nanostructured film enables the localized desorption of material upon irradiation by a spatially modulated laser beam. It was also demonstrated that the method uses the same type of optical modulation as in conventional lithography, without depending on photoresist or vacuum processes.

Original languageEnglish
Pages (from-to)3457-3461
Number of pages5
JournalAdvanced Materials
Issue number18
Publication statusPublished - 2008 Sep 17


All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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