Abstract
Several n-ZnO/p-Si photodiodes were fabricated using rf-sputter deposition with various Ar/O2 ratios at 480°C. The I-V measurements performed under continuous illumination on the photodiodes exhibited that a high responsivity of 0.286 A/W could be obtained from the photodiode prepared at an appropriate Ar/O2 ratio of 6:1. The same diode also showed the least dark current leakage while the diode prepared at the high O2 partial pressure (Ar/O2=2:1) revealed the largest. Temporal response was measured up to 35 ns from the best n-ZnO/p-Si diodes with the least current leakage and high responsivity in measurements at the high modulation frequency of 1.5 MHz.
Original language | English |
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Pages (from-to) | 2384-2387 |
Number of pages | 4 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 20 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2002 Nov |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering