Photosensitive terpolymer for all-wet-etching process: Material characterization and device fabrication

Abderrafia Moujoud, Sungho Kang, Hyun Jae Kim, Mark Andrews

Research output: Contribution to journalArticle

Abstract

A photosensitive terpolymeric composition suitable for practical waveguide devices is provided. The terpolymer was produced from pentafluorostyrene, perfluoro-n-octyl acrylate, and glycidyl methacrylate. We present a fabrication process where the device structure utilizes the same class of material for the core and cladding layers and it was fabricated without a plasma etching process. Based on the developed material and process; a 16-channel arrayed waveguide grating with good performance has been realized. During temperature cycling, a slight thickness hysteresis and refractive index hysteresis was observed above the glass transition temperature and is ascribed to the fact that the terpolymer material may not completely recover its elasticity in the heating/cooling cycle.

Original languageEnglish
Pages (from-to)2147-2151
Number of pages5
JournalThin Solid Films
Volume518
Issue number8
DOIs
Publication statusPublished - 2010 Feb 1

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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