Plasma-enhanced atomic layer deposition (PE-ALD) of TiO2 thin films using Ti(NMe2)4 [tetrakis(dimethylamido) Ti] and O2 plasma were prepared on stainless steel to show the self-cleaning effect. The TiO2 thin films deposited on stainless steel have high growth rate, large surface roughness, and low impurities. The film deposited below 200°C was amorphous, while the films deposited at 300 and 400°C showed anatase and rutile phases, respectively. The contact angle measurements on crystalline PE-ALD TiO2 thin films exhibited superhydrophilicity after UV irradiation. The TiO2 thin film with anatase phase deposited at 300°C showed the highest photocatalytic efficiency, which is higher than on Activ glass or thermal ALD TiO2 films. We suggest that anatase structure and large surface area of TiO2 thin film on stainless steel are the main factors for the high photocatalytic efficiency.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Materials Chemistry