Plasma-enhanced ALD of TiO2 thin films on SUS 304 stainless steel for photocatalytic application

Chang Soo Lee, Jungwon Kim, J. Y. Son, W. J. Maeng, Du Hwan Jo, Wonyong Choi, Hyungjun Kim

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Plasma-enhanced atomic layer deposition (PE-ALD) of TiO2 thin films using Ti(NMe2)4 [tetrakis(dimethylamido) Ti] and O2 plasma were prepared on stainless steel to show the self-cleaning effect. The TiO2 thin films deposited on stainless steel have high growth rate, large surface roughness, and low impurities. The film deposited below 200°C was amorphous, while the films deposited at 300 and 400°C showed anatase and rutile phases, respectively. The contact angle measurements on crystalline PE-ALD TiO2 thin films exhibited superhydrophilicity after UV irradiation. The TiO2 thin film with anatase phase deposited at 300°C showed the highest photocatalytic efficiency, which is higher than on Activ glass or thermal ALD TiO2 films. We suggest that anatase structure and large surface area of TiO2 thin film on stainless steel are the main factors for the high photocatalytic efficiency.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume156
Issue number5
DOIs
Publication statusPublished - 2009 Apr 8

Fingerprint

Stainless Steel
Stainless steel
Plasmas
Thin films
Titanium dioxide
Atomic layer deposition
Angle measurement
Contact angle
Cleaning
Surface roughness
Irradiation
Impurities
Crystalline materials
Glass
titanium dioxide

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

Lee, Chang Soo ; Kim, Jungwon ; Son, J. Y. ; Maeng, W. J. ; Jo, Du Hwan ; Choi, Wonyong ; Kim, Hyungjun. / Plasma-enhanced ALD of TiO2 thin films on SUS 304 stainless steel for photocatalytic application. In: Journal of the Electrochemical Society. 2009 ; Vol. 156, No. 5.
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abstract = "Plasma-enhanced atomic layer deposition (PE-ALD) of TiO2 thin films using Ti(NMe2)4 [tetrakis(dimethylamido) Ti] and O2 plasma were prepared on stainless steel to show the self-cleaning effect. The TiO2 thin films deposited on stainless steel have high growth rate, large surface roughness, and low impurities. The film deposited below 200°C was amorphous, while the films deposited at 300 and 400°C showed anatase and rutile phases, respectively. The contact angle measurements on crystalline PE-ALD TiO2 thin films exhibited superhydrophilicity after UV irradiation. The TiO2 thin film with anatase phase deposited at 300°C showed the highest photocatalytic efficiency, which is higher than on Activ glass or thermal ALD TiO2 films. We suggest that anatase structure and large surface area of TiO2 thin film on stainless steel are the main factors for the high photocatalytic efficiency.",
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Plasma-enhanced ALD of TiO2 thin films on SUS 304 stainless steel for photocatalytic application. / Lee, Chang Soo; Kim, Jungwon; Son, J. Y.; Maeng, W. J.; Jo, Du Hwan; Choi, Wonyong; Kim, Hyungjun.

In: Journal of the Electrochemical Society, Vol. 156, No. 5, 08.04.2009.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Plasma-enhanced ALD of TiO2 thin films on SUS 304 stainless steel for photocatalytic application

AU - Lee, Chang Soo

AU - Kim, Jungwon

AU - Son, J. Y.

AU - Maeng, W. J.

AU - Jo, Du Hwan

AU - Choi, Wonyong

AU - Kim, Hyungjun

PY - 2009/4/8

Y1 - 2009/4/8

N2 - Plasma-enhanced atomic layer deposition (PE-ALD) of TiO2 thin films using Ti(NMe2)4 [tetrakis(dimethylamido) Ti] and O2 plasma were prepared on stainless steel to show the self-cleaning effect. The TiO2 thin films deposited on stainless steel have high growth rate, large surface roughness, and low impurities. The film deposited below 200°C was amorphous, while the films deposited at 300 and 400°C showed anatase and rutile phases, respectively. The contact angle measurements on crystalline PE-ALD TiO2 thin films exhibited superhydrophilicity after UV irradiation. The TiO2 thin film with anatase phase deposited at 300°C showed the highest photocatalytic efficiency, which is higher than on Activ glass or thermal ALD TiO2 films. We suggest that anatase structure and large surface area of TiO2 thin film on stainless steel are the main factors for the high photocatalytic efficiency.

AB - Plasma-enhanced atomic layer deposition (PE-ALD) of TiO2 thin films using Ti(NMe2)4 [tetrakis(dimethylamido) Ti] and O2 plasma were prepared on stainless steel to show the self-cleaning effect. The TiO2 thin films deposited on stainless steel have high growth rate, large surface roughness, and low impurities. The film deposited below 200°C was amorphous, while the films deposited at 300 and 400°C showed anatase and rutile phases, respectively. The contact angle measurements on crystalline PE-ALD TiO2 thin films exhibited superhydrophilicity after UV irradiation. The TiO2 thin film with anatase phase deposited at 300°C showed the highest photocatalytic efficiency, which is higher than on Activ glass or thermal ALD TiO2 films. We suggest that anatase structure and large surface area of TiO2 thin film on stainless steel are the main factors for the high photocatalytic efficiency.

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