Abstract
A novel method to measure the positional plasma intensity, which indicates the uniformity of plasma processes, using optical emission spectroscopy (OES) with a spatially resolved ring lens (SRRL) is proposed. OES offers a noncontact and nondestructive plasma diagnostic tool and is easily implemented. Despite these advantages, the light intensities in local regions are difficult to measure by the principle of superposition of light. In this study, by blocking the light passage through the center of the SRRL, the intensity of the plasma light as a function of the distance in the process chamber is measured precisely. This methodology improves the distortion of the near light source and measures the local light intensities. Thus, it can be used to obtain the plasma distribution in a process chamber and thereby assess the uniformity of the plasma process.
| Original language | English |
|---|---|
| Article number | 7475885 |
| Pages (from-to) | 5674-5681 |
| Number of pages | 8 |
| Journal | IEEE Transactions on Industrial Electronics |
| Volume | 63 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 2016 Sep 1 |
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All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Computer Science Applications
- Electrical and Electronic Engineering
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Plasma Process Uniformity Diagnosis Technique Using Optical Emission Spectroscopy With Spatially Resolved Ring Lens. / Kim, In Joong; Yun, Ilgu.
In: IEEE Transactions on Industrial Electronics, Vol. 63, No. 9, 7475885, 01.09.2016, p. 5674-5681.Research output: Contribution to journal › Article
TY - JOUR
T1 - Plasma Process Uniformity Diagnosis Technique Using Optical Emission Spectroscopy With Spatially Resolved Ring Lens
AU - Kim, In Joong
AU - Yun, Ilgu
PY - 2016/9/1
Y1 - 2016/9/1
N2 - A novel method to measure the positional plasma intensity, which indicates the uniformity of plasma processes, using optical emission spectroscopy (OES) with a spatially resolved ring lens (SRRL) is proposed. OES offers a noncontact and nondestructive plasma diagnostic tool and is easily implemented. Despite these advantages, the light intensities in local regions are difficult to measure by the principle of superposition of light. In this study, by blocking the light passage through the center of the SRRL, the intensity of the plasma light as a function of the distance in the process chamber is measured precisely. This methodology improves the distortion of the near light source and measures the local light intensities. Thus, it can be used to obtain the plasma distribution in a process chamber and thereby assess the uniformity of the plasma process.
AB - A novel method to measure the positional plasma intensity, which indicates the uniformity of plasma processes, using optical emission spectroscopy (OES) with a spatially resolved ring lens (SRRL) is proposed. OES offers a noncontact and nondestructive plasma diagnostic tool and is easily implemented. Despite these advantages, the light intensities in local regions are difficult to measure by the principle of superposition of light. In this study, by blocking the light passage through the center of the SRRL, the intensity of the plasma light as a function of the distance in the process chamber is measured precisely. This methodology improves the distortion of the near light source and measures the local light intensities. Thus, it can be used to obtain the plasma distribution in a process chamber and thereby assess the uniformity of the plasma process.
UR - http://www.scopus.com/inward/record.url?scp=84983059154&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84983059154&partnerID=8YFLogxK
U2 - 10.1109/TIE.2016.2571261
DO - 10.1109/TIE.2016.2571261
M3 - Article
VL - 63
SP - 5674
EP - 5681
JO - IEEE Transactions on Industrial Electronics
JF - IEEE Transactions on Industrial Electronics
SN - 0278-0046
IS - 9
M1 - 7475885
ER -