Plasmonic lithography for fabricating nanoimprint masters with multi-scale patterns

Howon Jung, Seok Kim, Dandan Han, Jinhee Jang, Seonghyeon Oh, Jun Hyuk Choi, Eung Sug Lee, Jae W. Hahn

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

We successfully demonstrate the practical application of plasmonic lithography to fabricate nanoimprint masters. Using the properties of a non-propagating near-field, we achieve high-speed multi-scale patterning with different exposure time during the scanning. We modulate the width of the line patterns using a pulse light source with different duty cycles during the scanning of the probe. For practical application in plasmonic lithography, we apply a deep reactive ion etching process to transfer an arbitrary fluidic channel into a silicon substrate and fabricate a high-aspect-ratio imprint master. Subsequently, we carry out the imprint process to replicate the fluidic channel with an aspect ratio of 7.2. For pattern width below 100 nm, we adopt a three-layer structure of photoresist, hard layer, and polymer to record the near field and form a hard mask and transfer mask. Using the multilayer structure, we fabricate high-resolution nanoimprint masters in a silicon substrate with an aspect ratio greater than 1.

Original languageEnglish
Article number055004
JournalJournal of Micromechanics and Microengineering
Volume25
Issue number5
DOIs
Publication statusPublished - 2015 May 1

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Lithography
Aspect ratio
Fluidics
Silicon
Masks
Scanning
Reactive ion etching
Substrates
Photoresists
Light sources
Polymers
Multilayers

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Jung, Howon ; Kim, Seok ; Han, Dandan ; Jang, Jinhee ; Oh, Seonghyeon ; Choi, Jun Hyuk ; Lee, Eung Sug ; Hahn, Jae W. / Plasmonic lithography for fabricating nanoimprint masters with multi-scale patterns. In: Journal of Micromechanics and Microengineering. 2015 ; Vol. 25, No. 5.
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Plasmonic lithography for fabricating nanoimprint masters with multi-scale patterns. / Jung, Howon; Kim, Seok; Han, Dandan; Jang, Jinhee; Oh, Seonghyeon; Choi, Jun Hyuk; Lee, Eung Sug; Hahn, Jae W.

In: Journal of Micromechanics and Microengineering, Vol. 25, No. 5, 055004, 01.05.2015.

Research output: Contribution to journalArticle

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