Plasmonic nano lithography with a high scan speed contact probe

Yongwoo Kim, Seok Kim, Howon Jung, Eungman Lee, Jae W. Hahn

Research output: Contribution to journalArticle

75 Citations (Scopus)

Abstract

We demonstrate plasmonic lithography with an optical contact probe to achieve high speed patterning without external gap distance control between the probe and the photoresist. The bottom surface of the probe is covered with a 10 nm thickness silica glass film for the gap distance control and coated with self-assembled monolayer (SAM) to reduce friction between the probe and the photoresist. We achieve a patterning resolution of -50 nm and a patterning speed of -10 mm/s. We obtain the quality of line patterning comparable to that in conventional optical lithography.

Original languageEnglish
Pages (from-to)19476-19485
Number of pages10
JournalOptics Express
Volume17
Issue number22
DOIs
Publication statusPublished - 2009 Jan 1

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lithography
probes
photoresists
silica glass
friction
high speed

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

Kim, Yongwoo ; Kim, Seok ; Jung, Howon ; Lee, Eungman ; Hahn, Jae W. / Plasmonic nano lithography with a high scan speed contact probe. In: Optics Express. 2009 ; Vol. 17, No. 22. pp. 19476-19485.
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Plasmonic nano lithography with a high scan speed contact probe. / Kim, Yongwoo; Kim, Seok; Jung, Howon; Lee, Eungman; Hahn, Jae W.

In: Optics Express, Vol. 17, No. 22, 01.01.2009, p. 19476-19485.

Research output: Contribution to journalArticle

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