Plasmonic nano lithography with a high scan speed contact probe

Yongwoo Kim, Seok Kim, Howon Jung, Eungman Lee, Jae W. Hahn

Research output: Contribution to journalArticle

76 Citations (Scopus)

Abstract

We demonstrate plasmonic lithography with an optical contact probe to achieve high speed patterning without external gap distance control between the probe and the photoresist. The bottom surface of the probe is covered with a 10 nm thickness silica glass film for the gap distance control and coated with self-assembled monolayer (SAM) to reduce friction between the probe and the photoresist. We achieve a patterning resolution of -50 nm and a patterning speed of -10 mm/s. We obtain the quality of line patterning comparable to that in conventional optical lithography.

Original languageEnglish
Pages (from-to)19476-19485
Number of pages10
JournalOptics Express
Volume17
Issue number22
DOIs
Publication statusPublished - 2009 Jan 1

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Fingerprint Dive into the research topics of 'Plasmonic nano lithography with a high scan speed contact probe'. Together they form a unique fingerprint.

  • Cite this