Polybenzoxazole/graphene nanocomposite for etching hardmask

Seung Wook Shin, Jong Seon Kim, Seon Joon Kim, Dae Woo Kim, Hee Tae Jung

Research output: Contribution to journalArticle

Abstract

We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly(hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film.

Original languageEnglish
Pages (from-to)296-303
Number of pages8
JournalJournal of Industrial and Engineering Chemistry
Volume75
DOIs
Publication statusPublished - 2019 Jul 25

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Graphite
Graphene
Etching
Nanocomposites
Dimethylformamide
Dispersions
Organic solvents
Oxides
Methanol
Elastic moduli
Hardness

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)

Cite this

Shin, Seung Wook ; Kim, Jong Seon ; Kim, Seon Joon ; Kim, Dae Woo ; Jung, Hee Tae. / Polybenzoxazole/graphene nanocomposite for etching hardmask. In: Journal of Industrial and Engineering Chemistry. 2019 ; Vol. 75. pp. 296-303.
@article{15ca896b864b4cb8a8ea360c1f8012b6,
title = "Polybenzoxazole/graphene nanocomposite for etching hardmask",
abstract = "We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly(hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122{\%}), hardness (92{\%}), and etch resistance (54{\%}) were significantly enhanced at 17 wt.{\%} graphene loading, surpassing the properties of commercial CHM009 film.",
author = "Shin, {Seung Wook} and Kim, {Jong Seon} and Kim, {Seon Joon} and Kim, {Dae Woo} and Jung, {Hee Tae}",
year = "2019",
month = "7",
day = "25",
doi = "10.1016/j.jiec.2019.03.042",
language = "English",
volume = "75",
pages = "296--303",
journal = "Journal of Industrial and Engineering Chemistry",
issn = "1226-086X",
publisher = "Korean Society of Industrial Engineering Chemistry",

}

Polybenzoxazole/graphene nanocomposite for etching hardmask. / Shin, Seung Wook; Kim, Jong Seon; Kim, Seon Joon; Kim, Dae Woo; Jung, Hee Tae.

In: Journal of Industrial and Engineering Chemistry, Vol. 75, 25.07.2019, p. 296-303.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Polybenzoxazole/graphene nanocomposite for etching hardmask

AU - Shin, Seung Wook

AU - Kim, Jong Seon

AU - Kim, Seon Joon

AU - Kim, Dae Woo

AU - Jung, Hee Tae

PY - 2019/7/25

Y1 - 2019/7/25

N2 - We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly(hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film.

AB - We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly(hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film.

UR - http://www.scopus.com/inward/record.url?scp=85063686080&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85063686080&partnerID=8YFLogxK

U2 - 10.1016/j.jiec.2019.03.042

DO - 10.1016/j.jiec.2019.03.042

M3 - Article

AN - SCOPUS:85063686080

VL - 75

SP - 296

EP - 303

JO - Journal of Industrial and Engineering Chemistry

JF - Journal of Industrial and Engineering Chemistry

SN - 1226-086X

ER -