Polybenzoxazole/graphene nanocomposite for etching hardmask

Seung Wook Shin, Jong Seon Kim, Seon Joon Kim, Dae Woo Kim, Hee Tae Jung

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1 Citation (Scopus)


We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly(hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film.

Original languageEnglish
Pages (from-to)296-303
Number of pages8
JournalJournal of Industrial and Engineering Chemistry
Publication statusPublished - 2019 Jul 25

Bibliographical note

Funding Information:
This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education ( 2015R1A6A3A04057367 ). The authors declare no conflict of interest.

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)

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