Post-annealing effects on the surface roughness of undoped and Al-doped ZnO thin films deposited by atomic layer deposition

Yong June Choi, Kyung Mun Kang, Hyung Ho Park

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The post-annealing effects on the surface morphological changes of undoped and Al-doped ZnO (ZnO:Al) thin films deposited by atomic layer deposition (ALD) were investigated. The as-grown films were deposited by ALD at growth temperature of 200°C and also, post-annealing of the samples was accomplished at 300°C for 1 h under nitrogen atmosphere. The X-ray diffraction of the films was monitored to study the crystallinity of the films according to post-anneal. The field emission-scanning electron microscopy and atomic force microscopy were conducted to observe the surface morphological changes and measure the root-mean-square roughness of the films in order to analysis the post-annealing effects on the surface roughness of the films.

Original languageEnglish
Title of host publicationResources and Sustainable Development
Pages2492-2495
Number of pages4
DOIs
Publication statusPublished - 2013
Event2013 2nd International Conference on Energy and Environmental Protection, ICEEP 2013 - Guilin, China
Duration: 2013 Apr 192013 Apr 21

Publication series

NameAdvanced Materials Research
Volume734-737
ISSN (Print)1022-6680

Other

Other2013 2nd International Conference on Energy and Environmental Protection, ICEEP 2013
CountryChina
CityGuilin
Period13/4/1913/4/21

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Choi, Y. J., Kang, K. M., & Park, H. H. (2013). Post-annealing effects on the surface roughness of undoped and Al-doped ZnO thin films deposited by atomic layer deposition. In Resources and Sustainable Development (pp. 2492-2495). (Advanced Materials Research; Vol. 734-737). https://doi.org/10.4028/www.scientific.net/AMR.734-737.2492