Post-annealing effects on the surface roughness of undoped and Al-doped ZnO thin films deposited by atomic layer deposition

Yong June Choi, Kyung Mun Kang, Hyung Ho Park

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The post-annealing effects on the surface morphological changes of undoped and Al-doped ZnO (ZnO:Al) thin films deposited by atomic layer deposition (ALD) were investigated. The as-grown films were deposited by ALD at growth temperature of 200°C and also, post-annealing of the samples was accomplished at 300°C for 1 h under nitrogen atmosphere. The X-ray diffraction of the films was monitored to study the crystallinity of the films according to post-anneal. The field emission-scanning electron microscopy and atomic force microscopy were conducted to observe the surface morphological changes and measure the root-mean-square roughness of the films in order to analysis the post-annealing effects on the surface roughness of the films.

Original languageEnglish
Title of host publicationResources and Sustainable Development
Pages2492-2495
Number of pages4
Volume734-737
DOIs
Publication statusPublished - 2013 Oct 4
Event2013 2nd International Conference on Energy and Environmental Protection, ICEEP 2013 - Guilin, China
Duration: 2013 Apr 192013 Apr 21

Publication series

NameAdvanced Materials Research
Volume734-737
ISSN (Print)1022-6680

Other

Other2013 2nd International Conference on Energy and Environmental Protection, ICEEP 2013
CountryChina
CityGuilin
Period13/4/1913/4/21

Fingerprint

Atomic layer deposition
Surface roughness
Annealing
Thin films
Growth temperature
Field emission
Atomic force microscopy
Nitrogen
X ray diffraction
Scanning electron microscopy

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Choi, Y. J., Kang, K. M., & Park, H. H. (2013). Post-annealing effects on the surface roughness of undoped and Al-doped ZnO thin films deposited by atomic layer deposition. In Resources and Sustainable Development (Vol. 734-737, pp. 2492-2495). (Advanced Materials Research; Vol. 734-737). https://doi.org/10.4028/www.scientific.net/AMR.734-737.2492
Choi, Yong June ; Kang, Kyung Mun ; Park, Hyung Ho. / Post-annealing effects on the surface roughness of undoped and Al-doped ZnO thin films deposited by atomic layer deposition. Resources and Sustainable Development. Vol. 734-737 2013. pp. 2492-2495 (Advanced Materials Research).
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abstract = "The post-annealing effects on the surface morphological changes of undoped and Al-doped ZnO (ZnO:Al) thin films deposited by atomic layer deposition (ALD) were investigated. The as-grown films were deposited by ALD at growth temperature of 200°C and also, post-annealing of the samples was accomplished at 300°C for 1 h under nitrogen atmosphere. The X-ray diffraction of the films was monitored to study the crystallinity of the films according to post-anneal. The field emission-scanning electron microscopy and atomic force microscopy were conducted to observe the surface morphological changes and measure the root-mean-square roughness of the films in order to analysis the post-annealing effects on the surface roughness of the films.",
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Choi, YJ, Kang, KM & Park, HH 2013, Post-annealing effects on the surface roughness of undoped and Al-doped ZnO thin films deposited by atomic layer deposition. in Resources and Sustainable Development. vol. 734-737, Advanced Materials Research, vol. 734-737, pp. 2492-2495, 2013 2nd International Conference on Energy and Environmental Protection, ICEEP 2013, Guilin, China, 13/4/19. https://doi.org/10.4028/www.scientific.net/AMR.734-737.2492

Post-annealing effects on the surface roughness of undoped and Al-doped ZnO thin films deposited by atomic layer deposition. / Choi, Yong June; Kang, Kyung Mun; Park, Hyung Ho.

Resources and Sustainable Development. Vol. 734-737 2013. p. 2492-2495 (Advanced Materials Research; Vol. 734-737).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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