Abstract
Post-processing techniques are applied after the integration and assembly of nanostructures and Microelectromechanical Systems (MEMS) to realize integrated Nanoelectromechanical Systems (NEMS). Experimentation is focused specifically on the application of post-processing steps to a locally self-assembled micro-to-nano system comprising of suspended silicon nanowires between two MEMS bridges. Local contact metallization, global metallization for rapid system functionalization and the application of aqueous treatment to the NEMS are among the post-processing techniques studied. These techniques are evaluated for their effectiveness and compatibility with integrated NEMS and traditional MEMS processes. It is found that local and global contact metallization techniques effectively alleviate inherent problems at the nano-to-micro contact and the aqueous treatment study confirms the effectiveness of the super critical drying process for nanostructures.
| Original language | English |
|---|---|
| Pages (from-to) | 10-15 |
| Number of pages | 6 |
| Journal | Sensors and Actuators, A: Physical |
| Volume | 135 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2007 Mar 30 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Metals and Alloys
- Electrical and Electronic Engineering
Cite this
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Post-processing techniques for locally self-assembled silicon nanowires. / Englander, Ongi; Christensen, Dane; Kim, Jongbaeg; Lin, Liwei.
In: Sensors and Actuators, A: Physical, Vol. 135, No. 1, 30.03.2007, p. 10-15.Research output: Contribution to journal › Article
TY - JOUR
T1 - Post-processing techniques for locally self-assembled silicon nanowires
AU - Englander, Ongi
AU - Christensen, Dane
AU - Kim, Jongbaeg
AU - Lin, Liwei
PY - 2007/3/30
Y1 - 2007/3/30
N2 - Post-processing techniques are applied after the integration and assembly of nanostructures and Microelectromechanical Systems (MEMS) to realize integrated Nanoelectromechanical Systems (NEMS). Experimentation is focused specifically on the application of post-processing steps to a locally self-assembled micro-to-nano system comprising of suspended silicon nanowires between two MEMS bridges. Local contact metallization, global metallization for rapid system functionalization and the application of aqueous treatment to the NEMS are among the post-processing techniques studied. These techniques are evaluated for their effectiveness and compatibility with integrated NEMS and traditional MEMS processes. It is found that local and global contact metallization techniques effectively alleviate inherent problems at the nano-to-micro contact and the aqueous treatment study confirms the effectiveness of the super critical drying process for nanostructures.
AB - Post-processing techniques are applied after the integration and assembly of nanostructures and Microelectromechanical Systems (MEMS) to realize integrated Nanoelectromechanical Systems (NEMS). Experimentation is focused specifically on the application of post-processing steps to a locally self-assembled micro-to-nano system comprising of suspended silicon nanowires between two MEMS bridges. Local contact metallization, global metallization for rapid system functionalization and the application of aqueous treatment to the NEMS are among the post-processing techniques studied. These techniques are evaluated for their effectiveness and compatibility with integrated NEMS and traditional MEMS processes. It is found that local and global contact metallization techniques effectively alleviate inherent problems at the nano-to-micro contact and the aqueous treatment study confirms the effectiveness of the super critical drying process for nanostructures.
UR - http://www.scopus.com/inward/record.url?scp=33947248075&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33947248075&partnerID=8YFLogxK
U2 - 10.1016/j.sna.2006.08.004
DO - 10.1016/j.sna.2006.08.004
M3 - Article
AN - SCOPUS:33947248075
VL - 135
SP - 10
EP - 15
JO - Sensors and Actuators, A: Physical
JF - Sensors and Actuators, A: Physical
SN - 0924-4247
IS - 1
ER -