To control the wettability of a silicon surface, mixed monolayers of 11-cyanoundecyltrichlorosilane (CN(CH2)11SiCl3) and dodecyltrichlorosilane (CH3(CH2)11SiCl3) in different ratios were fabricated using a simple wiping method. The surface of the wiped mixed monolayers was reproducibly homogeneous and smooth and the water wettability of wiped surfaces was controlled successfully with linear dependency, where the composition of the mixed monolayers matched the composition of the deposition solution in a direct 1:1 fashion. From these results, the spread of the inkjet printed poly(3,4-ethylenedioxythiophene) doped with poly(styrene sulfonic acid) dots was controlled finely by the surface wettability of the wiped mixed monolayers.
Bibliographical noteFunding Information:
This work was supported by a grant (05K1501-01010) from “Center for Nanostructured Materials Technology” under “21st Century Frontier R&D Programs” and the ERC Program (R11-2003-006-03005-0) of the Ministry of Science and Technology, the Regional R&D Cluster Project (RT104-01-04) of MOCIE of Korea. The authors thank the Pohang Accelerator Laboratory for providing the 4B1 beam line.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry