Precise control of surface wettability of mixed monolayers using a simple wiping method

Jung Ah Lim; Jeong Ho Cho; Yunseok Jang; Joong Tark Han; Kilwon Cho

doi:10.1016/j.tsf.2006.07.003

Precise control of surface wettability of mixed monolayers using a simple wiping method

Jung Ah Lim, Jeong Ho Cho, Yunseok Jang, Joong Tark Han, Kilwon Cho

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

To control the wettability of a silicon surface, mixed monolayers of 11-cyanoundecyltrichlorosilane (CN(CH₂)₁₁SiCl₃) and dodecyltrichlorosilane (CH₃(CH₂)₁₁SiCl₃) in different ratios were fabricated using a simple wiping method. The surface of the wiped mixed monolayers was reproducibly homogeneous and smooth and the water wettability of wiped surfaces was controlled successfully with linear dependency, where the composition of the mixed monolayers matched the composition of the deposition solution in a direct 1:1 fashion. From these results, the spread of the inkjet printed poly(3,4-ethylenedioxythiophene) doped with poly(styrene sulfonic acid) dots was controlled finely by the surface wettability of the wiped mixed monolayers.

Original language	English
Pages (from-to)	2079-2084
Number of pages	6
Journal	Thin Solid Films
Volume	515
Issue number	4
DOIs	https://doi.org/10.1016/j.tsf.2006.07.003
Publication status	Published - 2006 Dec 5

Bibliographical note

Funding Information:
This work was supported by a grant (05K1501-01010) from “Center for Nanostructured Materials Technology” under “21st Century Frontier R&D Programs” and the ERC Program (R11-2003-006-03005-0) of the Ministry of Science and Technology, the Regional R&D Cluster Project (RT104-01-04) of MOCIE of Korea. The authors thank the Pohang Accelerator Laboratory for providing the 4B1 beam line.

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2006.07.003

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title = "Precise control of surface wettability of mixed monolayers using a simple wiping method",

abstract = "To control the wettability of a silicon surface, mixed monolayers of 11-cyanoundecyltrichlorosilane (CN(CH2)11SiCl3) and dodecyltrichlorosilane (CH3(CH2)11SiCl3) in different ratios were fabricated using a simple wiping method. The surface of the wiped mixed monolayers was reproducibly homogeneous and smooth and the water wettability of wiped surfaces was controlled successfully with linear dependency, where the composition of the mixed monolayers matched the composition of the deposition solution in a direct 1:1 fashion. From these results, the spread of the inkjet printed poly(3,4-ethylenedioxythiophene) doped with poly(styrene sulfonic acid) dots was controlled finely by the surface wettability of the wiped mixed monolayers.",

author = "Lim, {Jung Ah} and Cho, {Jeong Ho} and Yunseok Jang and Han, {Joong Tark} and Kilwon Cho",

note = "Funding Information: This work was supported by a grant (05K1501-01010) from “Center for Nanostructured Materials Technology” under “21st Century Frontier R&D Programs” and the ERC Program (R11-2003-006-03005-0) of the Ministry of Science and Technology, the Regional R&D Cluster Project (RT104-01-04) of MOCIE of Korea. The authors thank the Pohang Accelerator Laboratory for providing the 4B1 beam line.",

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doi = "10.1016/j.tsf.2006.07.003",

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AU - Lim, Jung Ah

AU - Cho, Jeong Ho

AU - Jang, Yunseok

AU - Han, Joong Tark

AU - Cho, Kilwon

N1 - Funding Information: This work was supported by a grant (05K1501-01010) from “Center for Nanostructured Materials Technology” under “21st Century Frontier R&D Programs” and the ERC Program (R11-2003-006-03005-0) of the Ministry of Science and Technology, the Regional R&D Cluster Project (RT104-01-04) of MOCIE of Korea. The authors thank the Pohang Accelerator Laboratory for providing the 4B1 beam line.

PY - 2006/12/5

Y1 - 2006/12/5

N2 - To control the wettability of a silicon surface, mixed monolayers of 11-cyanoundecyltrichlorosilane (CN(CH2)11SiCl3) and dodecyltrichlorosilane (CH3(CH2)11SiCl3) in different ratios were fabricated using a simple wiping method. The surface of the wiped mixed monolayers was reproducibly homogeneous and smooth and the water wettability of wiped surfaces was controlled successfully with linear dependency, where the composition of the mixed monolayers matched the composition of the deposition solution in a direct 1:1 fashion. From these results, the spread of the inkjet printed poly(3,4-ethylenedioxythiophene) doped with poly(styrene sulfonic acid) dots was controlled finely by the surface wettability of the wiped mixed monolayers.

AB - To control the wettability of a silicon surface, mixed monolayers of 11-cyanoundecyltrichlorosilane (CN(CH2)11SiCl3) and dodecyltrichlorosilane (CH3(CH2)11SiCl3) in different ratios were fabricated using a simple wiping method. The surface of the wiped mixed monolayers was reproducibly homogeneous and smooth and the water wettability of wiped surfaces was controlled successfully with linear dependency, where the composition of the mixed monolayers matched the composition of the deposition solution in a direct 1:1 fashion. From these results, the spread of the inkjet printed poly(3,4-ethylenedioxythiophene) doped with poly(styrene sulfonic acid) dots was controlled finely by the surface wettability of the wiped mixed monolayers.

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Precise control of surface wettability of mixed monolayers using a simple wiping method

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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